Thin film transistor array substrate, manufacturing method and display device

Abstract

A thin-film transistor array substrate, comprising: a substrate (10), a plurality of thin-film transistors (20) and a plurality of opening regions (30) formed on the substrate (10) in a grid arrangement, and further comprising on the substrate (10): a first insulating protective layer (11), a color-film layer (12), a pixel electrode (13), a common electrode (14), a second insulating protective layer (15), a through hole (16), an insulating layer (17), and a black matrix (18), the first insulating protective layer (11) is formed above a plurality of the thin-film transistors (20) and a plurality of the opening regions (30), the thin-film transistor (20) comprises a gate (21) and a drain (25), the pixel electrode (13) is in connection with the drain (25) via the through hole (16), and the black matrix (18) is located above the insulating layer (17) or above the pixel electrode (13) and the insulating layer (17), and is used for shielding the thin-film transistor (20) and the through hole (16).

Description

technical field [0001] The invention relates to the field of liquid crystal display manufacturing of thin film transistors, in particular to a thin film transistor array substrate, a manufacturing method of the thin film transistor array substrate and a display device with the thin film transistor array substrate. Background technique [0002] With the advancement of science and technology, liquid crystal display devices are developing towards high transmittance, high resolution, low power consumption and other directions. Among them, the higher the resolution, the smaller the size of each color filter layer. When the side length of the color filter layer changes from tens of microns to more than ten microns, obviously, the size of the color filter layer has been greatly reduced. , at this time, if the width of the black matrix dividing the color filter layer remains unchanged, the black matrix will become obvious relative to the color filter layer, which will affect the dis...

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Problems solved by technology

[0004] However, the traditional COA black matrix is ​​usually located between the drain of the thin film transistor and the pixel electrode. In order to realize the electrical connection between the drain and the pixel electrode, it is necessary to form a via hole in the black matrix, which will affect the black matrix to the drain. The shading effect of the pole causes the drain to reflect the light from the side of the via hole, which reduces the display effect of the display device

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