Method and device for processing thin ceramic plates
A ceramic thin plate and ceramic plate technology, which is applied in the field of ceramic thin plate processing and devices, can solve the problems of failure to achieve permanent durability and poor adhesion, and achieve the effect of strong adhesion, uniform adhesion and good effect
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[0018] Such as figure 1 As shown, in the conventional ceramic plate production and processing process, the ceramic plate fired by the firing kiln 1 of the ceramic thin plate production line is first cooled to 150-300 ° C, and then enters the spray system 2 for photocatalyst spray treatment; wherein the spray System 2 comprises at least one spray area, is provided with a plurality of spray heads 6 in the spray area, and the number of spray heads can be set according to needs; Be connected with spray head 6 and be provided with spray line 7 and be used for transporting photocatalyst material; Simultaneously on spray line A pressurizer 8 is provided to power the delivery process. After the spray treatment, the ceramic plate enters the warming and heating zone 3 for constant temperature heating treatment, and is heated to 400-550°C; the constant temperature treated ceramic plate enters the rapid cooling zone 4 and is rapidly cooled to 80-150°C; The brick platform 5 is transported...
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