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Polishing-material reclamation method
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A technology for grinding materials and objects to be ground, applied in separation methods, chemical instruments and methods, polishing compositions containing abrasives, etc., can solve problems such as separation of components that are difficult to be ground
Active Publication Date: 2015-06-10
KONICA MINOLTA INC
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Problems solved by technology
Generally, it is difficult to effectively separate the abrasive components contained in the waste liquid from the components to be ground. Therefore, the current situation is that the abrasive waste liquid is often discarded after use, and there is a problem in terms of disposal costs.
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preparation example Construction
[0045] (1) Preparation of abrasive material slurry
[0046] The powder of the abrasive is added and dispersed in a solvent such as water so that the concentration is within a concentration range of 1 to 40% by mass to prepare an abrasive slurry. Such asfigure 1 As shown, this abrasive slurry is circulated and supplied to the grinder 1 for use. As the particles used as the abrasive, those having an average particle diameter of several tens of nm to several μm are used.
[0047] In addition, it is preferable to add a dispersant or the like to the abrasive slurry used for circulating supply to prevent aggregation of the abrasive particles, and to maintain the dispersed state by continuously stirring with a stirrer or the like. Usually, it is preferable to employ a method of installing an abrasive slurry tank next to the grinder 1, continuously maintaining the dispersed state using a mixer, and circulating the slurry to the grinder 1 using a supply pump.
[0048] (2) Grinding
...
Embodiment
[0102] Hereinafter, the present invention will be described concretely with reference to examples, but the present invention is not limited to these examples. In addition, in an Example, the expression using "%" means "mass %" unless otherwise specified.
[0103] "Preparation of Recycled Abrasive Materials"
[0104] [Preparation of Regenerated Abrasive Material 1: Comparative Example 1]
[0105] Regenerated abrasive 1 using cerium oxide as an abrasive was prepared according to the following procedure. It should be noted that, unless otherwise specified, the abrasive regeneration step is basically carried out under the conditions of 25° C. and 55% RH. At this time, the temperature of the solution and the like was also 25°C. Additionally, 5% sulfuric acid or 5% sodium hydroxide was used as a pH additive.
[0106] 1) Slurry recovery process A
[0107] according to figure 1 In the grinding process described in , cerium oxide (manufactured by C.I. Kasei Co.) was used as the g...
example 2
[0122] In the preparation of the regenerated abrasive 1 described above, the regenerated abrasive 2 was obtained in the same manner except that the amount of sulfuric acid added in the pH adjustment step B was changed to 410 ml, and the pH value after the addition was adjusted to 6.0.
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Abstract
The purpose of the present invention is to obtain a highly pure reclaimed polishing material from a polishing-material slurry including already used polishing material. A polishing material, namely at least one selected from cerium oxide, diamond, boron nitride, silicon carbide, alumina, alumina zirconia, and zirconium oxide, is reclaimed from a polishing-material slurry including already used polishing material by undergoing: a slurry recovery step (A) for recovering the polishing-material slurry including polishing material having already been used to polish an object (3) to be polished, said object to be polished having silicon as a main component thereof; a pH adjustment step (B) in which the pH of the recovered polishing-material slurry is adjusted so as to be in the range of 7-10; a separation and concentration step (C) in which an alkali earth metal-containing metal salt is added as an inorganic salt to the polishing-material slurry having had the pH thereof adjusted, to cause the polishing material to agglomerate, and the polishing material is separated from the mother liquor and concentrated; and a polishing-material recovery step (D) in which the polishing material, having had been separated and concentrated, is subjected to solid-liquid separation, and recovered.
Description
technical field [0001] The invention relates to a grinding material regeneration method. Background technique [0002] As an abrasive material for precision grinding in the manufacturing process of glass optical elements, glass substrates, and semiconductor equipment, rare earth element oxides composed of cerium oxide and lanthanum oxide, neodymium oxide, and praseodymium oxide are currently used. things. Examples of other abrasives include diamond, iron oxide, alumina, zirconia, colloidal silica, and the like. [0003] Generally, the main constituent elements of abrasive materials include materials obtained from minerals not produced in Japan, some of which depend on imported resources, and most of the materials are expensive. Therefore, it is necessary to technically respond to recycling of resources for the abrasive waste liquid containing the used abrasive. [0004] Generally, as a treatment method for wastewater containing suspended particles generated in various ind...
Claims
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Application Information
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