Accumulation-type gas supply device

Abstract

The purpose of the present invention is to increase the number of gas supply lines in an accumulation-type gas supply device for a semiconductor manufacturing apparatus, to reduce the size of the device, and to reduce the internal volume of the gas channels inside the device while enhancing the gas replacement properties of the device, minimizing installation space, and making various equipment easier to maintain. Two flow control devices (3) provided with a plurality of flow controllers are secured in a mutually opposed combination to a gas-inlet-side block (12) and a gas-outlet-side block (13) set apart from one another as viewed from above, and the flow control devices (3) are provided with an inlet opening / closing valve (1) and an outlet opening / closing valve (5), whereby a gas supply unit (U) provided with at least four gas supply lines (S) is formed, and a plurality of the gas supply units (U) are secured in a stacked configuration.

Description

technical field [0001] The present invention relates to an improvement of an integrated gas supply device, and relates to an integrated gas supply device capable of increasing the number of gas supply lines, reducing the size of the integrated gas supply device, facilitating maintenance and inspection, and improving gas replacement properties. Background technique [0002] Conventionally, a so-called integrated gas supply device is used to supply processing gas to semiconductor manufacturing equipment and the like. [0003] Figure 15 It is a figure showing an example, and the two-way on-off valves 41A, 41B, the three-way on-off valves 42A, 42B, the flow control device 43, etc. are passed through blocks 44, 45, 46, 47, 48 provided with gas flow paths. Integrate in series to form one gas supply line, and arrange and fix the gas supply line in parallel in multiple rows via blocks 45 and 49 to form an integrated gas supply device (Japanese Patent Application Laid-Open No. 5-172...

AI Technical Summary

Problems solved by technology

[0015] The present invention is to solve the above-mentioned problems in the conventional integrated gas supply device, that is, a) In the conventional gas supply device, the inlet on-off valve and the three-way on-off valve for purification are connected in a row (in series). In a device with a structure in which a plurality of gas supply lines S are arranged and fixed in parallel on the base plate, such as flow controllers, outlet on-off valves, etc., it is difficult to reduce the size of the device, and it cannot cope with the increase in the number of gas supply lines. increase and reduction of installation space; b) it is difficult to reduce the internal fluid passage volume of the integrated gas supply device to improve the replacement of gas, etc., to provide the following integrated gas supply device: through the flow controller Its own structure and the combined structure of multiple flow supply lines are improved, so that, for example, in an integrated gas supply device with 16 gas supply lines, the overall dimensions of the device are W=240mm, L=270mm, and L=270mm. H=240mm or less, and by realizing a large reduction in the volume of the gas passage inside the gas supply device, the volume of the clean room is reduced and the gas replacement performance is greatly improved, and even if it is installed on the top of a semiconductor manufacturing device, etc., It is also easy to perform maintenance and inspection, and can realize high-precision flow control and stable supply of clean gas, etc.

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