Unlock instant, AI-driven research and patent intelligence for your innovation.

Method and device for correcting laser pulses

A technology of laser pulses and laser light sources, which is applied in lasers, laser welding equipment, laser parts, etc., can solve problems such as difficulty in maintaining the pulse shape, and achieve the effect of preventing defects

Inactive Publication Date: 2017-09-08
AP SYST INC
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when using a facility using two or more laser light sources to complement energy between the laser light sources, variation in scattering occurs between the laser light sources over time, and thus there is a limit in that it is difficult Maintains the shape of the pulses produced by the combination of the original laser sources

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for correcting laser pulses
  • Method and device for correcting laser pulses
  • Method and device for correcting laser pulses

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] Hereinafter, exemplary embodiments of the present invention will be described in more detail with reference to the accompanying drawings. However, the present invention is embodied in different forms and should not be regarded as limited to the embodiments set forth herein. Rather, these embodiments are provided so that the present invention is thorough and complete, and fully convey the scope of the present invention to those skilled in the art. The same symbols on the drawings represent the same components.

[0049] Hereinafter, although the embodiment of the present invention is described by using a laser correction device, it is obvious that the embodiment can also be applied to all substrate processing devices, laser processing devices, laser annealing devices, and lasers to which the laser correction device is applied. Heat treatment device.

[0050] figure 1 It is a block diagram of a laser calibration device according to an embodiment of the present invention.

[00...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A method and an apparatus for compensating laser pulses are provided. The method includes following steps: measuring an individual laser pulse, including measuring a peak value of individual laser pulse emitted from a plurality of laser sources and subjected to intensity adjustment by each individual attenuator; controlling the angle of incidence of each attenuator, wherein the angle of incidence of the attenuator assigned to a laser source outside an error range is adjusted when the peak value of the individual laser pulse is outside an individual error range set in advance; and repeating the step of measuring an individual laser pulse and the step of controlling the angle of incidence of an individual attenuator until the peak value of the individual laser pulse is in an individual error range set in advance. By compensating changes of wave forms of pulses of each laser source, defects in a process can be prevented.

Description

Technical field [0001] The present invention relates to a method and apparatus for correcting laser pulses, and more specifically, to a method and apparatus for correcting the energy intensity of laser pulses when the laser pulses are irradiated to a substrate. Background technique [0002] Since it is difficult to ensure uniformity due to an increase in the size of the substrate when performing annealing after depositing a thin film, there are many alternatives, one of which is an annealing method using laser pulses. [0003] Three main factors can affect laser annealing. The three factors include: beam profile, which represents the line length and uniformity of the irradiated laser beam; laser energy, which represents the energy intensity of the laser pulse; and pulse shape, which represents the pulse shape of the laser beam. These three factors are values ​​that can change as the number of laser pulses increases. When these factors have values ​​exceeding the reference range, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/0622H01L21/67
CPCB23K26/04H01S3/105H01S3/2383
Inventor 金贤中方勇植朴建植池昊真
Owner AP SYST INC