Magnetron sputtering coating equipment
A magnetron sputtering coating and equipment technology, applied in the field of material surface coating, can solve the problems of inability to achieve coating, adverse effects of process repeatability, air pressure fluctuation, etc. The effect of air pressure fluctuations
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[0016] like Figure 4 As shown, a magnetron sputtering coating equipment includes a cathode target 11 horizontally arranged on a base 10, the cathode target 11 is a rectangular plate structure, a substrate 12 is arranged above the cathode target 11, and the cathode target A magnet 15 is arranged under the material 11, and the magnet 15 forms an arched magnetic field on the upper surface of the cathode target 11. The equipment also includes a gas supply unit for blowing an inert gas to the upper surface of the cathode target 11. The gas supply unit includes The gas supply pipeline arranged along the length direction of the cathode target, the gas supply pipeline 13 is provided with a plurality of air outlet holes 131 at intervals along the tube length direction, and the layout density of the gas outlet holes 131 in the middle section of the gas supply pipeline 13 is smaller than that at both ends , so that the concentration of inert gas in the middle section of the cathode targ...
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