Fixed focusing device for photoetching direct-writing system
A lithography direct writing and focusing technology, applied in optics, opto-mechanical equipment, photo-engraving process of patterned surface, etc., can solve problems such as reducing production capacity and affecting production efficiency, and achieve convenient and fast focusing and reasonable design. Effect
Inactive Publication Date: 2015-10-07
HEFEI ADVANTOOLS SEMICON
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Problems solved by technology
In this way, in production, for printed circuit boards with different specifications and thicknesses, it is necessary to replace the backing board many times and then adjust the focus, which reduces the production capacity and directly affects the production efficiency.
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[0013] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0014] Such as figure 1 As shown, an embodiment of the present invention provides a hybrid focusing device for a lithographic direct writing system, which includes a fixed focusing component and a continuous focusing component, and the exposure light path passes through the fixed focusing component and the continuous focusing component in sequence. The focusing assembly completes the focusing, the fixed focusing assembly has several fixed thickness re...
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The invention discloses a fixed focusing device for a photoetching direct-writing system. The fixed focusing device comprises a fixed focusing assembly and a continuous focusing assembly, wherein an exposure light path sequentially penetrates through the fixed focusing assembly and the continuous focusing assembly to finish focusing; the fixed focusing assembly comprises a plurality of fixed thickness regions with different thicknesses; the thickness of the continuous focusing assembly can linearly change; the fixed focusing assembly is capable of changing the fixed thickness region through which the exposure light path penetrates; and the continuous focusing assembly is capable of changing the thickness of the position through which the exposure light path penetrates. By virtue of respective characteristics of the fixed focusing assembly and the continuous focusing assembly, the fixed focusing assembly is capable of fixedly changing the focusing amount within a large range when glass regions with different thicknesses are selected; the continuous focusing assembly is capable of realizing continuous focusing when corresponding to one glass thickness of the fixed focusing assembly; large-range continuous focusing can be realized when the fixed focusing assembly and the continuous focusing assembly are used together; and the fixed focusing device is reasonable in design and is convenient and fast in focusing.
Description
technical field [0001] The invention relates to the field of maskless photolithographic direct writing equipment in the PCB printed circuit board industry, and specifically provides a focal plane adjustment device for different PCB board thicknesses. Background technique [0002] In the maskless lithography direct writing system, the focal plane adjustment of the lithography objective lens directly affects the quality of lithography products. Lithography objectives typically have a narrow depth of focus range, and printed circuit board thickness differences often extend far beyond the depth of focus range. At present, most of the focusing modules in lithography equipment can only realize the focusing function in a small range. When there is a large difference in plate thickness, different backing plates need to be selected to adjust the focal plane. In this way, in production, for printed circuit boards with different specifications and thicknesses, the focus needs to be ad...
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Inventor 张磊王晓光
Owner HEFEI ADVANTOOLS SEMICON