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Susceptors for enhanced process uniformity and reduced substrate slippage

A substrate, susceptor plate technology used in semiconductor processing. In the field, it can solve problems such as substrate sliding and processing non-uniformity

Inactive Publication Date: 2015-10-28
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The inventors have noted that conventionally used susceptor designs can lead to non-uniform processing and problems with substrate slippage when the substrate is placed on the susceptor

Method used

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  • Susceptors for enhanced process uniformity and reduced substrate slippage
  • Susceptors for enhanced process uniformity and reduced substrate slippage
  • Susceptors for enhanced process uniformity and reduced substrate slippage

Examples

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Embodiment Construction

[0021] Provided herein is an apparatus for supporting a substrate. In some embodiments, the inventive apparatus may advantageously provide one or more substrate support elements that prevent the substrate from sliding as it is placed on the substrate support. In some embodiments, the inventive apparatus may further advantageously reduce the contact area between the substrate support member and the substrate, thereby reducing process non-uniformity due to thermal gradients in the substrate.

[0022] figure 1 Illustrated is a schematic side view of a processing chamber 100 suitable for use with an apparatus for supporting a substrate according to some embodiments of the invention. In some embodiments, the processing chamber 100 may be a commercially available processing chamber (such as ® ® ® ® available from Applied Materials, Inc., Santa Clara, California). reactor), or any suitable semiconductor processing chamber suitable for performing an epitaxial deposition process. ...

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PUM

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Abstract

Apparatus for supporting a substrate are provided herein. In some embodiments, a substrate support includes a susceptor plate having a top surface; a recess formed within the top surface, wherein the recess is defined by an edge; and a plurality of angled support elements disposed within the recess and along the edge of the recess, wherein each angled support element comprises a first surface downwardly sloped toward a center of the recess.

Description

technical field [0001] Embodiments of the invention relate generally to semiconductor processing. Background technique [0002] A susceptor is used to hold a substrate in a processing region of a substrate processing chamber, such as an epitaxial deposition chamber. The inventors have noted that conventionally used susceptor designs can lead to non-uniform processing and problems with substrate slippage when the substrate is placed on the susceptor. [0003] Accordingly, the inventors have provided embodiments of improved susceptors for supporting substrates. Contents of the invention [0004] Provided herein is an apparatus for supporting a substrate. In some embodiments, the substrate support includes: a susceptor plate having a top surface; a groove formed in the top surface, wherein the groove is bounded by an edge; and a plurality of inclined support elements, the plurality of inclined support elements are arranged in the groove and arranged along the edge of the g...

Claims

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Application Information

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IPC IPC(8): H01L21/683H01L21/205C23C16/458
CPCH01L21/68735H01L21/68742C30B25/12H01L21/67115C23C16/4585
Inventor 甘加达尔·希拉瓦特马哈德夫·乔希青木裕司
Owner APPLIED MATERIALS INC