A high-reliability thin-film bulk acoustic wave resonator and its manufacturing method
A thin-film bulk acoustic wave and reliability technology, applied in impedance networks, electrical components, etc., can solve problems affecting FBAR quality factor, FBAR frequency influence, easy oxidation, deterioration, etc., to improve isolation, increase open circuit impedance, and improve quality factor Effect
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[0047] see figure 2 , which is a schematic cross-sectional view of Embodiment 1 of the FBAR of the present application. There is an isolation layer 7 on the substrate 1 , and the size of the isolation layer 7 is the same as that of the substrate 1 , that is, the isolation layer 7 is on the entire substrate 1 . The substrate 1 is, for example, silicon, sapphire, gallium arsenide, gallium nitride, silicon carbide, quartz, glass and other substrate materials. The isolation layer 7 is, for example, silicon oxide, silicon nitride, silicon oxynitride, aluminum nitride and other materials. An air cavity 2 recessed downward from the upper surface of the substrate 1 is provided between the substrate 1 and the isolation layer 7 . On the isolation layer 7 there are respectively the lower electrode 3 , the piezoelectric layer 4 and the upper electrode 5 . The lower electrode 3 and the upper electrode 5 are, for example, metal materials such as aluminum, gold, aluminum-copper alloy, al...
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