42results about How to "Fine graphics" patented technology

Systems, methods, and devices provide alarms and alerts in an on-body networked diabetes management system. Methods may include receiving glucose sensor data from a continuous glucose monitor and determining a dosage of insulin delivery based at least in part on the glucose sensor data. The method may include detecting an alarm or alert condition, and sending a wireless communication regarding the alarm or alert condition to a remote user-interface device. The method may include triggering an audible, visual, or haptic alarm or alert on the insulin delivery device unless an acknowledgement of the alarm or alert condition is received within a predetermined period of time.

The present disclosure provides a photosensitive resin composition and a method for forming a quantum dot pattern using the same. The photosensitive resin composition includes quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer. The method for forming a quantum dot pattern includes coating, exposing and developing a photoresist to obtain the quantum dot pattern, wherein the photoresist is the above-mentioned photosensitive resin composition.

The invention belongs to the technical field of carbon micro electro mechanical system, and provides a preparation method of a carbon microelectrode array structure. The method comprises steps of: (1) photolithography to obtain a carbon micro structure part of the array; (2) metal precipitation: precipitating one or more metal layers on the surface of the obtained carbon micro structure; and (3) pyrolysis: carrying out multiple steps of pyrolysis in an inert gas atmosphere or inert mixed gas atmosphere and at different temperatures. According to the above steps, carbon microelectrode array structure with nano structure integrated on the surface can be grew and obtained. The method of the invention combines thick photoresist lithography, metal precipitation and pyrolysis, so that the obtained micro-nano integrated structure has large specific surface area. The method of the present invention can be used in a micro electro mechanical system, and has the advantages of simple technology, low cost, high controllability, mass growth and good structure. The obtained micro-nano integrated structure has good electrical properties, and can be used as a motor and be widely applied to microcomputer fields, such as the minicell and micro electrochemical sensor, etc.

The invention discloses a formation method of a semiconductor device. The formation method comprises steps of: providing a substrate, a grid membrane arranged on the surface of the substrate and an initial mask layer arranged on the surface of the grid membrane; forming a graphical photoresist layer on the initial mask layer; taking the graphical photoresist layer as a mask, and etching the initial mask layer to form multiple separated hard mask layers, wherein polymer impurities are formed on the hard mask layers and the surface of the gate membrane; using the ashing technology to remove the graphical photoresist layer, wherein the ashing technology comprises first ashing technology and second ashing technology which are carries out successively, the first ashing technology is suitable for removing of silicon ions in the polymer impurities and the second ashing technology is suitable for removing carbon ions in the polymer impurities; after the ashing technology is performed, carrying out wet-process cleaning processing on the hard mask layers and the grid membrane; taking the hard mask layers as masks and etching the grid membrane so as to form multiple separated grid electrodes on the substrate; and forming a source region and a drainage region in the substrate on two sides of the grid electrodes. In this way, the quality of the formed grid electrodes is improved.