Photosensitive resin composition and method for preparing quantum dot pattern with photosensitive resin composition

A photosensitive resin and composition technology, which is applied in the fields of optomechanical equipment, photosensitive material processing, and photosensitive materials for optomechanical equipment, etc. It can solve the problem that the template pattern cannot be accurately transferred to the substrate, it is difficult to achieve mass production, and the quantum dots are easy to use. shedding and other problems, to achieve the effect of improving the application potential, combining stability, and not easy to fall off

Active Publication Date: 2016-08-31
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main problems in the preparation of quantum dot films by printing method are: quantum dots are easy to fall off; the template pattern cannot be accurately transferred to the substrate; the resolution is low, and the size is on the order of 100 μm; the diffusion of printing ink easily causes the pattern to widen; it is difficult to achieve large-scale production, etc.

Method used

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  • Photosensitive resin composition and method for preparing quantum dot pattern with photosensitive resin composition
  • Photosensitive resin composition and method for preparing quantum dot pattern with photosensitive resin composition
  • Photosensitive resin composition and method for preparing quantum dot pattern with photosensitive resin composition

Examples

Experimental program
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Effect test

Embodiment 1

[0043] 20% by weight of alkali-soluble resin SB400, 10% by weight of photosensitive resin or monomer containing ethylenically unsaturated double bonds (trade name: SR494), 15% by weight of quantum dots, 2% by weight Photoinitiator (trade name: CIBA369), 0.1% by weight of silane coupling agent (trade name: KH550), 0.1% by weight of dispersant (trade name: DisperBYK160), as an auxiliary agent, 52.8% by weight The solvent propylene glycol methyl ether acetate is mixed uniformly to obtain a photosensitive resin composition.

Embodiment 2

[0045] 45% by weight of alkali-soluble resin SB400, 0.5% by weight of photosensitive resin or monomer containing ethylenically unsaturated double bonds (trade name: SR494), 4% by weight of quantum dots, 0.1% by weight Photoinitiator (trade name: CIBA369), 7% by weight of silane coupling agent (trade name: KH560), 1% by weight of dispersant (trade name: DisperBYK2000), as an auxiliary agent, 42.4% by weight The solvent propylene glycol methyl ether acetate is mixed uniformly to obtain a photosensitive resin composition.

Embodiment 3

[0047] 5% by weight of alkali-soluble resin SB401, 18% by weight of photosensitive resin or monomer containing ethylenically unsaturated double bonds (trade name: SR295), 3% by weight of quantum dots, 3% by weight Light initiator (trade name: CIBA369), 6% by weight of silane coupling agent (trade name: KH570), 0.6% by weight of leveling agent (trade name: EB350), 64.4% by weight of solvent propylene glycol The methyl ether acetate is uniformly mixed to obtain a photosensitive resin composition.

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Abstract

The present disclosure provides a photosensitive resin composition and a method for forming a quantum dot pattern using the same. The photosensitive resin composition includes quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer. The method for forming a quantum dot pattern includes coating, exposing and developing a photoresist to obtain the quantum dot pattern, wherein the photoresist is the above-mentioned photosensitive resin composition.

Description

technical field [0001] The invention relates to a photosensitive resin composition and a method for preparing quantum dot patterns with the photosensitive resin composition. Background technique [0002] Quantum dots, also known as semiconductor nanocrystals, are a new type of semiconductor nanomaterial with a size of 1-10nm. They have unique photoluminescence (EL) and electroluminescence (PL) properties due to quantum size effects and dielectric confinement effects. Compared with traditional organic fluorescent dyes, quantum dots have high quantum yield, high photochemical stability, not easy to photolysis, wide excitation, narrow emission, high color purity, luminous color can be adjusted by controlling the size of quantum dots, etc. optical properties. Therefore, the application of quantum dots in display, lighting, solar cells, biomarkers and other fields has become a research hotspot all over the world. [0003] In the field of display, quantum dots (as EL and PL) ha...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027G03F7/00
CPCG03F7/031G03F7/0048G03F7/027G03F7/028G03F7/029G03F7/032G03F7/20G03F7/30
Inventor 谷敬霞舒适张锋惠官宝
Owner BOE TECH GRP CO LTD
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