Preparation method of carbon microelectrode array structure

An array structure and carbon microelectrode technology, which is applied in the direction of microstructure technology, microstructure devices, and manufacturing microstructure devices, can solve the problems of generating wrinkles and not considering the preparation of nano-fold structures, and achieve fine graphics, long service life, The effect of increasing the surface area
CN102730628BInactive Publication Date: 2015-03-04HUAZHONG UNIV OF SCI & TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
HUAZHONG UNIV OF SCI & TECH
Publication Date
2015-03-04
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention belongs to the technical field of carbon micro electro mechanical system, and provides a preparation method of a carbon microelectrode array structure. The method comprises steps of: (1) photolithography to obtain a carbon micro structure part of the array; (2) metal precipitation: precipitating one or more metal layers on the surface of the obtained carbon micro structure; and (3) pyrolysis: carrying out multiple steps of pyrolysis in an inert gas atmosphere or inert mixed gas atmosphere and at different temperatures. According to the above steps, carbon microelectrode array structure with nano structure integrated on the surface can be grew and obtained. The method of the invention combines thick photoresist lithography, metal precipitation and pyrolysis, so that the obtained micro-nano integrated structure has large specific surface area. The method of the present invention can be used in a micro electro mechanical system, and has the advantages of simple technology, low cost, high controllability, mass growth and good structure. The obtained micro-nano integrated structure has good electrical properties, and can be used as a motor and be widely applied to microcomputer fields, such as the minicell and micro electrochemical sensor, etc.
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Description

technical field

[0001] The invention belongs to the field of carbon micro-electromechanical technology, and in particular relates to a method for preparing a carbon micro-electrode array structure with micro-nano metal folds integrated on the surface. The prepared array structure can be used as a micro-electrode and applied to micro-batteries, biochips and micro-electrochemistry Sensors and other micro-electromechanical fields. Background technique

[0002] Carbon Micro-Electro-Mechanical Systems (C-MEMS) technology is a manufacturing technology of thick-resist lithography combined with high-temperature pyrolysis (usually around 1000 degrees), which is based on high-viscosity photoresist (such as SU-8 glue) and conventional photoresist The three-dimensional cross-linked microstructure is generated by the engraving process, and then the cross-linked structure is pyrolyzed into a glassy carbon structure by controlling the temperature rise in a pyrolysis furnace and an inert at...

Claims

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