Photosensitive resin combination and method of preparing quantum dot pattern from photosensitive resin combination

A technology of photosensitive resin and composition, which is applied in the direction of photomechanical equipment, photosensitive material processing, and photosensitive materials used in photomechanical equipment. Problems such as falling off, to achieve the effect of improving application potential, combining stability, and not easy to fall off

Active Publication Date: 2014-04-16
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main problems in the preparation of quantum dot films by printing method are: quantum dots are easy to fall off; the template pattern cannot be accurately transferred to the substrat

Method used

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  • Photosensitive resin combination and method of preparing quantum dot pattern from photosensitive resin combination
  • Photosensitive resin combination and method of preparing quantum dot pattern from photosensitive resin combination
  • Photosensitive resin combination and method of preparing quantum dot pattern from photosensitive resin combination

Examples

Experimental program
Comparison scheme
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Example Embodiment

[0042] Example 1

[0043] 20% by weight of alkali-soluble resin SB400, 10% by weight of photosensitive resin or monomer containing ethylenically unsaturated double bonds (trade name: SR494), 15% by weight of quantum dots, 2% by weight Photoinitiator (trade name: CIBA369), 0.1% by weight of silane coupling agent (trade name: KH550), 0.1% by weight of dispersant (trade name: DisperBYK160), as an auxiliary, 52.8% by weight The solvent propylene glycol methyl ether acetate is uniformly mixed to obtain a photosensitive resin composition.

Example Embodiment

[0044] Example 2

[0045] 45% by weight of alkali-soluble resin SB400, 0.5% by weight of photosensitive resin or monomer containing ethylenically unsaturated double bonds (trade name: SR494), 4% by weight of quantum dots, 0.1% by weight Photoinitiator (trade name: CIBA369), 7% by weight of silane coupling agent (trade name: KH560), 1% by weight of dispersant (trade name: DisperBYK2000), as an auxiliary, 42.4% by weight The solvent propylene glycol methyl ether acetate is mixed uniformly to obtain a photosensitive resin composition.

Example Embodiment

[0046] Example 3

[0047] 5% by weight of alkali-soluble resin SB401, 18% by weight of photosensitive resin or monomer containing ethylenically unsaturated double bonds (trade name: SR295), 3% by weight of quantum dots, 3% by weight Light initiator (trade name: CIBA369), 6% weight parts of silane coupling agent (trade name: KH570), 0.6% weight parts of leveling agent (trade name: EB350), 64.4% weight parts of solvent propylene glycol Methyl ether acetate is uniformly mixed to obtain a photosensitive resin composition.

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Abstract

The invention discloses a photosensitive resin combination and a method of preparing a quantum dot pattern from the photosensitive resin combination. The photosensitive resin combination is prepared from quantum dots which are dispersed in the photosensitive resin combination and are respectively provided with a modified layer. The method of preparing the quantum dot pattern from the photosensitive resin combination comprises the steps: with the photosensitive resin combination as a photoresist, carrying out coating, exposure and development to obtain the quantum dot pattern. The method of preparing the quantum dot pattern from the photosensitive resin combination has the advantage of being simple, the fine graph, the boding stability of the combination and a substrate, the difficulty in abscission, the high resolution and the like can be achieved. In addition, with the adoption of the method, based on existing equipment, the mass production of the quantum dot pattern can be realized, and the application potential of the quantum dots is greatly improved.

Description

technical field [0001] The invention relates to a photosensitive resin composition and a method for preparing quantum dot patterns with the photosensitive resin composition. Background technique [0002] Quantum dots, also known as semiconductor nanocrystals, are a new type of semiconductor nanomaterial with a size of 1-10nm. They have unique photoluminescence (EL) and electroluminescence (PL) properties due to quantum size effects and dielectric confinement effects. Compared with traditional organic fluorescent dyes, quantum dots have high quantum yield, high photochemical stability, not easy to photolysis, wide excitation, narrow emission, high color purity, luminous color can be adjusted by controlling the size of quantum dots, etc. optical properties. Therefore, the application of quantum dots in display, lighting, solar cells, biomarkers and other fields has become a research hotspot all over the world. [0003] In the field of display, quantum dots (as EL and PL) ha...

Claims

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Application Information

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IPC IPC(8): G03F7/004G03F7/027G03F7/00
CPCG03F7/031G03F7/0048G03F7/027G03F7/028G03F7/029G03F7/032G03F7/20G03F7/30
Inventor 谷敬霞舒适张锋惠官宝
Owner BOE TECH GRP CO LTD
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