Method for manufacturing microwave thin film attenuator
A technology of a microwave thin film and a manufacturing method, which is applied to waveguide-type devices, electrical components, circuits, etc., can solve the problems of difficult control and realization of wrapping grounding, poor grounding effect, and low production efficiency, and is conducive to miniaturization and processing. High efficiency and beneficial to mass production
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[0037] Such as figure 1 Shown as a specific embodiment of the present invention, the manufacturing method of the microwave thin film attenuator mainly includes the following steps:
[0038] Step 101: Process the dielectric substrate by laser cutting, and form through holes in the ground electrode in advance;
[0039] Step 102: Use a vacuum sputtering method to realize metallization on the surface of the dielectric substrate and the through hole;
[0040] Step 103: Use a photolithography process to form an attenuator pattern;
[0041] Step 104: Plating a thickened conductor circuit to satisfy bonding connectivity and improve grounding reliability;
[0042] Step 105: Perform thermal oxidation resistance adjustment on the entire attenuator circuit by heating;
[0043] Step 106: Use the probe station to perform index test on the attenuator;
[0044] Step 107: Use a dicing method to divide into independent attenuator patterns, and reflect the side metalization effect on the four corners of the...
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