Etching liquid composition and etching method

Abstract

The invention relates to a display device of a flat panel display (FPD) and an etching liquid composition for the transparent conductive film used for the electrodes of a solar cell or a touch control panel, and provides an etching liquid composition for etching transparent conductive films such as copper and/or copper alloy film and indium tin oxide simultaneously, which includes hydrochloric acid, ferric chloride or copper chloride and water, wherein the concentration of hydrochloric acid is from 15.0 to 36.0 weight%, and the concentration of ferric chloride or copper chloride is from 0.05 to 2.00 weight%.

Description

technical field [0001] The present invention relates to simultaneous etching of transparent conductive films used in FPD (Flat Panel Display) display devices, solar cells, electrodes in touch panel sensors, etc., and copper and / or copper alloy films used in wiring, etc. Etching liquid composition, and the etching method using this etching liquid composition. Background technique [0002] Transparent conductive films are light-transmitting conductive materials used in flat-panel displays such as LCDs (liquid crystal displays) and ELDs (electroluminescent displays), solar cells, and touch panels. These transparent conductive films are made of, for example, indium tin oxide, indium oxide, tin oxide, or zinc oxide, among which indium tin oxide (hereinafter also referred to as ITO) is widely used. [0003] In order to use a transparent conductive film as an electrode of an FPD display, a solar cell, a touch panel, etc., it is necessary to form the transparent conductive film wit...

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Problems solved by technology

[0014] However, in the same document, it is pointed out that the ITO film is also aimed at amorphous, and cannot be applied to a device using a crystallized ITO

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