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Low scattering silica glass, and method for thermally treating silica glass

一种热处理方法、石英玻璃的技术，应用在玻璃的成型、玻璃生产、玻璃制造设备等方向，能够解决石英玻璃透射率降低等问题，达到瑞利散射系数小、光传输损耗小、假想温度高的效果

Active Publication Date: 2016-04-06
AGC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] It is known that the transmittance of quartz glass decreases when irradiated with high-energy ultraviolet rays

Method used

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  • Low scattering silica glass, and method for thermally treating silica glass
  • Low scattering silica glass, and method for thermally treating silica glass
  • Low scattering silica glass, and method for thermally treating silica glass

Examples

Experimental program
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Effect test

Embodiment

[0108] Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited to this.

[0109] Examples 1-3, Examples 6-8, and Example 14 are examples of the glass of the present invention, and Examples 4-5 and Examples 9-13 are comparative examples.

[0110] Examples 1-3, Example 6 and Example 14 are examples of the first method of the present invention. Examples 7 and 8 are examples of the second method of the present invention.

[0111] [Heat treatment of quartz glass]

example 1、2

[0113] Put dense quartz glass with an OH content of less than 50ppm into a pressure vessel, use argon as a pressurized medium, use a HIP device, and use a pump to heat while increasing the pressure of the gas. At 1800° C., the pressure (unit: MPa) shown in the column of pressure 1 in Tables 1 and 2 was maintained for 3.5 hours, and then the pump was stopped and quenched. The average cooling rate (unit: °C / min) from 1200°C to 900°C is described in the column of the cooling rate. During cooling, the pressure decreases due to thermal contraction of the gas.

[0114] In Tables 1 and 2, pressure 1 is the maximum pressure (unit: MPa) applied at the temperature shown in the column of temperature, and pressure 2 is the pressure (unit: MPa) when the temperature reaches 900° C. during the cooling process.

[0115] Holding time 1 shown in Tables 1 and 2 is the time for holding at the temperature shown in the column of temperature while applying the pressure shown in pressure 1, and hold...

example 3～5

[0117] Using the same quartz glass as in Examples 1 and 2, the pressure (unit: MPa) shown in the column of pressure 1 in Table 1 was applied at 1800° C. and held for 3.5 hours. The same as in Example 1 except that Carry out heat treatment.

[0118] (Example 6, 7)

[0119] Using the same quartz glass as in Example 1, after applying the pressure shown in the column of pressure 1 in Table 1 while maintaining at 1800°C for 2 hours, the temperature was lowered to 1600°C for Example 6, and the temperature was lowered for Example 7. As a result, the temperature decreased to 1200° C. and the pressure decreased, so the pressure was increased again using a pump, and the pressure shown in the column of applied pressure 1 was maintained for 0.5 hours. Afterwards, the pump was stopped and quenched.

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PUM

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Abstract

Provided is a low scattering silica glass which is suitable as a material for an optical communication fiber. A silica glass having a fictive temperature of 1000 DEG C higher and having a pore radius of 0.240 nm or less as observed by a positron annihilation lifetime method. A method for thermally treating a silica glass, said method comprising holding the silica glass to be thermally treated under an atmosphere having a temperature ranging from 1200 to 2000 DEG C inclusive and a pressure of 30 MPa or more and then cooling the silica glass, wherein the procedure for cooling the silica glass from 1200 to 900 DEG C is carried out at an average temperature-lowering rate of 40 DEG C / min or more. A method for thermally treating a silica glass, said method comprising holding the silica glass to be thermally treated under an atmosphere having a temperature ranging from 1200 to 2000 DEG C inclusive and a pressure of 140 MPa or more and then cooling the silica glass, wherein the procedure for cooling the silica glass from 1200 to 900 DEG C is carried out under an atmosphere having a pressure of 140 MPa or more.

Description

technical field [0001] The present invention relates to quartz glass having a small Rayleigh scattering coefficient and a heat treatment method for reducing the Rayleigh scattering coefficient of the quartz glass. Background technique [0002] The transmission loss of an optical fiber has a significant impact on the performance of an optical communication network. As a material for optical fibers, quartz glass is widely used. It is considered that the transmission loss of optical fiber is mainly caused by Rayleigh scattering of quartz glass in the wavelength region of about 1550 nm used in ordinary optical communication networks. [0003] It is known that the higher the fictive temperature of the quartz glass is, the larger the Rayleigh scattering coefficient of the quartz glass is. Therefore, as a method of manufacturing an optical fiber, a method of reducing the fictive temperature of silica glass to reduce the Rayleigh scattering coefficient and reduce the optical trans...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B37/15C03B20/00C03B37/10
CPCC03B37/02727C03C3/06C03B19/1453C03B32/005C03B2201/04C03B2205/56Y02P40/57C03B2201/075C03B2201/31C03B2201/42C03B25/02
Inventor 小野円佳伊藤节郎本间脩网野阳介
Owner AGC INC
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