Unlock instant, AI-driven research and patent intelligence for your innovation.

A processing method for ultrasonic-assisted laser plasma backside wet etching of quartz glass

A quartz glass, ultrasonic-assisted technology, applied in the direction of laser welding equipment, metal processing equipment, manufacturing tools, etc., can solve the problems of severe residual stress and microcracks in the recast layer, affecting the quality of quartz glass surface processing, etc., and achieve good processing results , low cost, and less damage

Inactive Publication Date: 2018-12-04
JIANGNAN UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are also some problems in laser etching. For example, the surface layer of processed materials will leave a serious recast layer and inevitable residual stress and microcracks, which will directly affect the surface processing quality of quartz glass.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A processing method for ultrasonic-assisted laser plasma backside wet etching of quartz glass
  • A processing method for ultrasonic-assisted laser plasma backside wet etching of quartz glass
  • A processing method for ultrasonic-assisted laser plasma backside wet etching of quartz glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] In order to make the technical solution of the present invention more clearly expressed, the present invention will be further described below by selecting reasonable laser system process parameters and ultrasonic system process parameters in conjunction with the accompanying drawings.

[0029] see figure 2 , a processing method for etching quartz glass by ultrasonic-assisted laser plasma back wet etching, comprising:

[0030] (1) Fix the quartz glass on the fixture, and add copper sulfate solution to the container:

[0031] The size of the quartz glass sheet is 50x50x3mm. Fix the quartz glass at a reasonable position on the workbench so that the processing position is exactly the center of the quartz glass sheet, and add copper sulfate solution to the container until the container is full of solution.

[0032] (2) Determine the laser system process parameters and ultrasonic system process parameters for laser etching quartz glass:

[0033] Start the air switch and l...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for etching quartz glass through an ultrasonic-assisted laser plasma back wet etching method and belongs to the field of non-traditional machining. The machining method mainly comprises four steps as follows: (1) the quartz glass is well clamped on a fixture, and a copper sulfate solution is added to a container; (2) laser system technological parameters and ultrasonic system technological parameters for laser etching of the quartz glass are determined; (3) a laser scanning path and scanning speed are determined; (4) the quartz glass is etched by an ultrasonic-assisted laser according to the scanning path. The method mainly adopts the laser back wet etching method for etching of the quartz glass, ultrasonic vibration, ultrasonic cleaning and the composite machining effect of ultrasonic vibration and ultrasonic cleaning are added on the basis of laser etching, and the quartz glass is etched through the ultrasonic-assisted laser plasma back wet etching method. With the adoption of the method, no obvious slag and recast layers exist on surfaces of grooves etched in surfaces of the quartz glass, the surfaces are smooth and clean, and the machining effect is good.

Description

Technical areas: [0001] The invention relates to a processing method for etching quartz glass using ultrasonic-assisted laser plasma back wet etching, and belongs to the application field of special processing. Background technique: [0002] Quartz glass has become a popular choice in the optoelectronics, microelectronics, optics and optical fiber industries due to a series of excellent physical and chemical properties such as high hardness, good thermal properties, acid and alkali resistance, high insulation, high light transmittance in various bands and good chemical stability. An important material with broad development prospects. With the development of modern science and technology, quartz glass has very high requirements for its processing accuracy and surface quality. However, because quartz glass is a hard and brittle material with high brittleness and low toughness, so The processing of this material is difficult. Traditional processing methods such as chemical etc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/364B23K26/70B23K26/346B23K26/122C03C15/00
CPCB23K26/1224B23K26/346B23K26/364B23K26/702B23K2103/54C03C15/00C03C2203/20
Inventor 丛启东袁根福章辰
Owner JIANGNAN UNIV