Anisotropic conductive film and semiconductor device using same
An anisotropic, conductive film technology, applied to semiconductor devices, electric solid devices, conductive layers on insulating carriers, etc., can solve the problems of reducing composition flow, undisclosed adjustment of anisotropic conductive film of insulating particles, etc., to achieve Effect of Improving Connection Characteristics
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Embodiment 1
[0136] Preparation of Conductive Layer Composition
[0137] As the binder resin that functions as a matrix for forming a film, 20 parts by weight of a phenoxy resin (PKHH, Inchemrez company, U.S.) dissolved in a xylene / ethyl acetate azeotrope mixed solvent by 40% by volume, as The curing agent that carries out curing reaction then uses 15 parts by weight of propylene oxide series epoxy resin (EP-4000S, Adeka company, Japan), 10 parts by weight of propylene oxide series epoxy resin (EP-4010S, Adeka company, Japan), Use (Si-60L, Sanshin Chemical, Japan) 5 parts by weight as a thermosetting cationic curing agent, use 30 parts by weight as insulating particles for adding fluidity and insulation (SFP-20M, DENKA, Japan), and use conductive particles ( AUL-704, average particle diameter 4 μm, SEKISUI company, Japan) 20 parts by weight, insulation treatment was performed and mixed to prepare a conductive layer composition.
[0138] Preparation of insulating layer composition
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Embodiment 2
[0147] The anisotropic conductive film of Example 2 was produced by the same method and conditions as in Example 1 except that the content of each composition was adjusted as shown in the above-mentioned Table 1 in Example 1.
Embodiment 3
[0149] In Example 1, the anisotropic conductive film of Example 3 was produced by the same method and conditions as in Example 1 except that the content of each composition was adjusted as shown in Table 1 above.
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