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Quantitative X-ray Analysis - Ratio Correction

An X-ray and energy technology, applied in the field of devices to realize the method, can solve problems such as difficult calculation of matrix correction

Active Publication Date: 2020-08-04
PANALYTICAL BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Often difficult to calculate matrix correction

Method used

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  • Quantitative X-ray Analysis - Ratio Correction
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  • Quantitative X-ray Analysis - Ratio Correction

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Embodiment Construction

[0047] The present invention relates to a method applicable for the correction of photon intensities measured in X-ray diffraction in transmission geometry without explicit knowledge of the thickness of the sample.

[0048] theory

[0049] XRD measurements performed in transmission geometry require the sample being measured to have a limited thickness in order to allow the generated photons to escape from the sample from the backside and at a certain exit angle. Theoretical calculations predict that the calculated photon intensity will depend on the sample thickness as well as the composition. In this sense, even for samples prepared from a single sample, the reproducibility of measurements with respect to sample preparation can be highly affected, given that different dilution ratios (binder / material) are applied during sample preparation.

[0050] The absorption of X-rays through the sample is determined by:

[0051]

[0052] It is the mass attenuation coefficient of the ...

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Abstract

This application relates to Quantitative X-ray Analysis - Ratio Correction. The method of X-ray analysis measures X-ray diffraction in transmission. To perform quantitative measurements, background measurements are made slightly away from the diffraction peak, and the ratio of the measured intensities is used to correct for variations in sample composition.

Description

technical field [0001] The invention relates to a method of quantitative X-ray analysis and a device for carrying out the method. [0002] Background of the invention [0003] Material analysis using X-rays provides accurate data in many applications and industries. X-ray fluorescence measurements allow the determination of the elemental composition of a sample. In some applications however this is not sufficient and there is a need to determine not only the elemental composition but also structural parameters such as the crystalline phase of the sample, and X-ray diffraction is used in these cases. [0004] Typically, high-resolution X-ray diffraction measurements are performed in reflection mode, where an incoming beam of X-rays is incident on a first surface of the sample, and X-rays diffracted from the same surface of the sample at a diffraction angle 2θ are detected by a detector . [0005] In some applications, it is useful to be able to perform X-ray diffraction mea...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N23/207
CPCG01N23/207G01N23/223G01N2223/071G01N23/20G01N23/2206
Inventor 瓦尔瑟如斯·凡丹霍根霍夫查拉兰波斯·扎尔卡达斯
Owner PANALYTICAL BV