Device for depositing a material by pulsed laser deposition and a method for depositing a material with the device
A technology of pulsed laser deposition and deposition materials, which is applied in metal material coating process, ion implantation plating, coating, etc., and can solve the problem of not being able to manufacture layered structures
Active Publication Date: 2016-10-12
LAM RES CORP
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Problems solved by technology
However, currently available pulsed laser deposition methods on large surface areas cannot fabricate layered structures on areas other than circular surface areas, such as in the fabrication of large organic light-emitting displays (OLEDs).
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Embodiment Construction
[0054] Such as figure 1 As shown, the apparatus 1 comprises a laser 2 , a target 3 in the shape of a cylindrical rod and a substrate 4 . By striking the target 3 with the laser 2 , a plasma plume 5 of particles with a center 6 is generated which is directed towards the substrate 4 . The substrate 4 can be moved at least in a first direction A, while the incident position 7 of the laser light on the target 3 can be changed in a second direction B. The substrate 4 can also be rotated in direction C about its axis 8 . By the movement of the substrate 4 in the direction A and the simultaneous movement of the incidence position 7 of the laser light 2 on the surface of the target 3 in the direction B, the plasma plume 5 moves in a repeating pattern on the substrate 4 .
[0055] Figure 2A with 2B The movement of the incident position 7 of the laser light 2 on the target 3 is shown. exist Figure 2A , the incident position 7 of the laser 2 is selected such that it is the same a...
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Abstract
The invention relates to a device for depositing a material by pulsed laser deposition, the device comprising: a vacuum chamber; at least one substrate holder with a substrate, arranged inside the vacuum chamber, the substrate having a first, second and third direction, each of the three directions perpendicular to each other, wherein the substrate is movable by the substrate holder in the first direction; a target holder with a target, arranged inside the vacuum chamber and wherein the target extends over substantially the full length in the second direction of the substrate and parallel to the substrate; at least one laser for irradiating the target, thereby creating a plasma of material that deposits on the substrate, wherein the position of incidence of the laser on the target is moveable parallel to the second direction of the substrate; and a controller for controlling the movement of the substrate holder and the movement of the position of incidence of the laser on the target.
Description
technical field [0001] The invention relates to an apparatus for depositing material by pulsed laser deposition and to a method for depositing material using the apparatus. Background technique [0002] With pulsed laser deposition, the target material is irradiated with laser light in a vacuum chamber. As a result of the excitation, a plasma plume of material is generated with the central axis of the plume perpendicular to the incident location on the target. This plasma plume of material is directed towards a substrate where deposition of particles in the plasma plume occurs. [0003] It is beneficial to be able to apply pulsed laser deposition over relatively large surface areas in a wide range of applications. However, currently available pulsed laser deposition methods on large surface areas cannot fabricate layered structures on areas other than circular surface areas, such as for large organic light-emitting displays (OLEDs). In EP 2159300 one such currently availa...
Claims
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IPC IPC(8): C23C14/28C23C14/50
CPCC23C14/28C23C14/50C23C14/225C23C14/3407C23C14/3485C23C14/54H01J37/3423H10K71/00
Inventor J·M·德克斯J·A·扬森斯
Owner LAM RES CORP