A kind of preparation method and application of touch screen cover plate and film
A screen cover film and thin film technology, which is applied in the field of touch screen cover and film preparation, can solve the problems of inability to achieve perfect fit, high production cost, and low production efficiency, and achieve surface scratch resistance and wear resistance Strong, low production cost, high production efficiency
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Embodiment 1
[0056] The touch screen cover film of the present embodiment comprises silicon monoxide (SiO) film, zinc nitride (Zn 3 N 2 ) film, silicon nitride (Si 3 N 4 ) film and a protective film; wherein, the thickness of the silicon oxide film is 10nm, the thickness of the zinc nitride film is 10nm, the thickness of the silicon nitride film is 50nm, and the protective film is a conventional plastic protective film in this field.
[0057] The touch screen cover of this embodiment includes a resin substrate and the above-mentioned touch screen cover film, and the silicon oxide film of the touch screen cover film is connected to the resin substrate.
[0058] figure 1 It is a structural schematic diagram of the touch screen cover plate of the embodiment 1, wherein, 1 is a protective film, 2 is a silicon nitride film, 3 is a zinc nitride film, 4 is a silicon oxide film, and 5 is a resin substrate.
[0059] The preparation method of the composite resin cover plate of the present embodim...
Embodiment 2
[0070] The touch screen cover film of the present embodiment comprises silicon monoxide (SiO) film, zinc nitride (Zn 3 N 2 ) film, silicon nitride (Si 3 N 4 ) film and a protective film; wherein, the thickness of the silicon oxide film is 20nm, the thickness of the zinc nitride film is 30nm, the thickness of the silicon nitride film is 150nm, and the protective film is a conventional plastic protective film in this field.
[0071] The touch screen cover of this embodiment includes a resin substrate and a touch screen cover film, and the silicon oxide film of the touch screen cover film is connected to the resin substrate.
[0072] The preparation method of the composite resin cover plate of the present embodiment is except following parameters, and all the other are identical with embodiment 1:
[0073] In step (1), the working pressure of reactive sputtering is 11×10 -3 mbar; the volume flow rate of argon gas is 800 sccm, and the gas flow rate of oxygen gas is 500 sccm; t...
Embodiment 3
[0077] The touch screen cover film of the present embodiment comprises silicon monoxide (SiO) film, zinc nitride (Zn 3 N 2 ) film, silicon nitride (Si 3 N 4 ) film and a protective film; wherein, the silicon oxide film has a thickness of 15nm, the zinc nitride film has a thickness of 50nm, and the silicon nitride film has a thickness of 100nm, and the protective film is a conventional plastic protective film in this field.
[0078] The touch screen cover of this embodiment includes a resin substrate and the above-mentioned touch screen cover film, and the silicon oxide film of the touch screen cover film is connected to the resin substrate.
[0079] The preparation method of the composite resin cover plate of the present embodiment is except following parameters, and all the other are identical with embodiment 1:
[0080] In step (1), the working pressure of reactive sputtering is 5×10 -3 mbar; the volume flow rate of argon gas is 400 sccm, and the gas flow rate of oxygen ...
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Abstract
Description
Claims
Application Information
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