Method for flattening original film base belt for magnetron sputtering coating

A magnetron sputtering coating and film-based technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc., can solve problems affecting product quality and photoelectric performance indicators of deposited films

Inactive Publication Date: 2016-10-26
南京汇金锦元光电材料有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Affected by this factor, the deposition thickness of the magnetron sputtering coating will change, which wi

Method used

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  • Method for flattening original film base belt for magnetron sputtering coating
  • Method for flattening original film base belt for magnetron sputtering coating
  • Method for flattening original film base belt for magnetron sputtering coating

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Embodiment Construction

[0017] Below in conjunction with accompanying drawing, this technology is further described:

[0018] see figure 1 , figure 2 A kind of flattening roller shown, comprises roller shaft 1, and roller shaft 1 is made of hard material; The generatrix that the middle part of outer surface of roller shaft 1 protrudes is circular arc; The diameter of the section circle in the outer surface of roller shaft 1 is greater than The diameter of the end face circle on the outer surface of the roller shaft 1; on the outer surface of the roller shaft 1, there is also a spiral groove 2 symmetrical to the middle section of the roller shaft, and the spiral groove on the left side of the middle section of the roller shaft 1 is left-handed, and is located on the roller shaft 1 The spiral groove on the right side of the middle section is right-handed; the rotation direction of the roller shaft 1 is right-handed.

[0019] In order to ensure the sufficient strength of the roller shaft 1, avoid the...

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Abstract

The invention provides a method for flattening an original film base belt for magnetron sputtering coating. The method is used for winding a base material in the operation process of flexible or winding type or continuous magnetron sputtering coating and flattening the base belt in the fabric width direction in the base material winding process. According to the method, a rotary flattening roller is used for flattening the original film base belt. The flattening roller comprises a roller shaft which is made of hard materials. The roller shaft is in the shape of a drum with the two ends thin and the middle thick. The diameter of the middle section circle of the outer surface of the roller shaft is larger than the diameter of end face circles of the outer surface of the roller shaft. The outer surface of the roller shaft is further provided with spiral grooves symmetrical with respect to the middle section of the roller shaft. The rotating direction of the flattening roller meets the requirements that the point where the spiral grooves in the outer surface of the roller shaft make contact with the original film base belt at the later moment is farther from the middle section of the roller shaft than the point where the spiral grooves in the outer surface of the roller shaft make contact with the original film base belt at the former moment.

Description

technical field [0001] This technology relates to the field of magnetron sputtering coating, and provides a method for flattening the base tape of the original film of magnetron sputtering coating, which is used for winding the base tape in the process of flexible, winding and continuous magnetron sputtering coating operations, and When the base tape is wound, the base tape is flattened in the width direction. Background technique [0002] The thickness of the original film substrate used in flexible, winding, and continuous magnetron sputtering coatings is on the order of microns, and the length is about one kilometer or more. Due to the effect of traction and the stress of the flexible original film base belt itself, the surface of the flexible original film base belt in the width direction is uneven. Affected by this factor, the deposition thickness during magnetron sputtering coating will change, which will affect the photoelectric performance index of the deposited fil...

Claims

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Application Information

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IPC IPC(8): C23C14/56C23C14/35
CPCC23C14/56C23C14/35
Inventor 王鲁南杜杰朱丽萍叶智镇李锺允朴勝一全武贤朴翰镇王建华窦立峰
Owner 南京汇金锦元光电材料有限公司
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