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Polysiloxane copolymer, antistatic agent and resin composition containing same

A resin composition, polysiloxane technology, applied in other chemical processes, chemical instruments and methods, etc., can solve the problem that the silicone resin has no heat resistance, the curing reaction of the silicone resin is not fully carried out, and the strength characteristic cannot be obtained. Resin composition and other problems, to achieve the effect of excellent heat resistance and high antistatic performance

Active Publication Date: 2019-11-26
SHIN ETSU CHEM IND CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, ammonium-type onium salts and polysiloxane copolymers containing them do not have sufficient heat resistance to withstand high temperatures during melt kneading.
In addition, regarding the silicone resin, it was found that the curing reaction of the silicone resin did not proceed sufficiently, and it was not possible to obtain a silicone resin composition having practical strength characteristics as an optical adhesive (see Comparative Examples described later).

Method used

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  • Polysiloxane copolymer, antistatic agent and resin composition containing same
  • Polysiloxane copolymer, antistatic agent and resin composition containing same
  • Polysiloxane copolymer, antistatic agent and resin composition containing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0095] Next, the present invention will be specifically described based on examples, but the present invention is not limited by these examples.

[0096] In the examples, the surface resistivity was measured under the conditions of 23±3° C. and humidity of 45±5% using Hirester UP (MCP-HT450) manufactured by Mitsubishi Chemical Corporation.

[0097] In addition, regarding heat resistance evaluation, using TG / DTA220 manufactured by Seiko Instruments Co., Ltd., in the measurement results of TG-DTA measured under a nitrogen atmosphere and a temperature increase of 10°C / min, the temperature at which 5% of the mass is reduced Set as the decomposition temperature. When the decomposition temperature is 300°C or higher, it is considered to have heat resistance that can be melt-kneaded in polycarbonate resin, and the evaluation is "A". Adequate with a "C" rating.

manufacture example 1

[0099] In a 500 mL glass reactor equipped with a stirring device, 130.3 g (1.1 mol) of dimethyldimethoxysilane, 42.20 g (0.31 mol) of methyltrimethoxysilane, and 136.3 g of isopropanol were charged under a nitrogen atmosphere. g and 1-(3-trimethoxysilylpropyl)-1,1,1-tributylphosphonium=bis(trifluoromethanesulfonyl) produced by the method described in JP-A-2010-248165 ) imine 100.0 g (0.15 mol). After adding 30.00 g of 0.1N hydrochloric acid dropwise to the obtained mixture at room temperature, it was further stirred at room temperature for 16 hours, and the obtained reaction mixture was concentrated at 80° C. for 4 hours using a rotary evaporator. The obtained concentrated residue was liquid-separated and washed twice with 272.5 g of n-hexane, and then concentrated at 80° C. for 5 hours using a rotary evaporator to obtain 120.2 g of polysiloxane copolymer A as a white suspension liquid.

manufacture example 2

[0101] Except having used 45.90 g (0.31 mol) of vinyltrimethoxysilanes instead of methyltrimethoxysilane, it carried out similarly to manufacture example 1, and obtained the polysiloxane copolymer B123.10g of white suspension liquid.

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Abstract

The present invention provides a silicone resin capable of imparting high antistatic properties to a resin, having good heat resistance capable of withstanding high temperatures during melt-kneading in the resin, and capable of producing a silicone resin having practical strength characteristics as an optical adhesive polysiloxane copolymers. A polysiloxane copolymer comprising an onium salt represented by formula (1), a trialkoxysilane represented by formula (2), and a dialkoxysilane represented by formula (3) as optional components obtained by copolymerization.

Description

technical field [0001] The present invention relates to a polysiloxane copolymer, an antistatic agent containing it, and a resin composition containing the antistatic agent. Background technique [0002] It has been reported that the cation is ammonium or phosphonium having a trialkoxysilylalkyl group, and the anion is a perfluoroalkylsulfonylimide onium salt that can be used as a low-molecular-weight antistatic agent for fluororesins (refer to Patent Document 1 : Japanese Patent Application Laid-Open No. 2010-248165). However, the present inventors determined that 1-(3-trimethoxysilylpropyl)-1,1,1-tributylphosphonium=bis(trifluoromethanesulfonyl)imide, which is one of the above-mentioned onium salts, As an antistatic agent for polycarbonate resins, acrylic resins, and silicone resins, it was found that although antistatic properties can be imparted to silicone resins, practical antistatic properties cannot be imparted to polycarbonate resins and acrylic resins. Furthermor...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G77/26C08G77/30C08L33/00C08L69/00C08L83/04C08L101/00C09K3/16
CPCC08G77/26C08G77/30C08L33/00C08L69/00C08L83/04C08L101/00C09K3/16
Inventor 山田哲郎吉川裕司石井祐典今泉晓
Owner SHIN ETSU CHEM IND CO LTD