Banana and honey hydrating mask and making method thereof

A production method and honey technology are applied in the directions of pharmaceutical formulations, cosmetic preparations, cosmetic preparations, etc., which can solve problems such as toxic side effects and skin problems, and achieve the effect of promoting metabolism.

Inactive Publication Date: 2016-11-23
陆媛媛
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Most of the various hydrating skin products currently on the market contain some chemically synthesized substances or pharmaceutical ingredients that can cause toxic and side effects, and long-term use will cause new skin problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] A banana honey water replenishing facial mask is composed of the following ingredients in parts by weight: 30 parts of bananas, 5 parts of egg yolks, 20 parts of honey, 5 parts of flour and an appropriate amount of water.

[0017] Its specific production method is as follows:

[0018] (1) This hair reconciles honey with bananas and mashes them into a puree;

[0019] (2) Mix the honey-banana puree described in step (1) with egg yolk, flour, and water evenly, and stir into a paste.

Embodiment 2

[0021] A banana honey water replenishing facial mask is composed of the following ingredients in parts by weight: 50 parts of banana, 10 parts of egg yolk, 30 parts of honey, 10 parts of flour and appropriate amount of water.

[0022] Its specific production method is as follows:

[0023] (1) This hair reconciles honey with bananas and mashes them into a puree;

[0024] (2) Mix the honey-banana puree described in step (1) with egg yolk, flour, and water evenly, and stir into a paste.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the field of beauty products and discloses a banana and honey hydrating mask. The banana and honey hydrating mask is made from, by weight, 30-50 parts of banana, 5-10 parts of egg yolk, 20-30 parts of honey, 5-10 parts of flour and a proper amount of water. The banana and honey hydrating mask has the effects of gentling cleansing, nourishing, repairing, moisturizing and is free of toxic and side effects through long-term usage.

Description

technical field [0001] The invention relates to the field of beauty products, in particular to a banana honey moisturizing facial mask and a preparation method thereof. Background technique [0002] Environmental pollution in modern society is becoming more and more serious, which has also caused a series of skin problems, such as dry skin, peeling, yellowing and even chloasma and pigmentation. With the progress of society and the continuous improvement of people's living standards, people's life concepts and consumption concepts are also constantly changing. People pay more and more attention to their own image. Various cosmetics and skin care products have become indispensable daily necessities for many people. . [0003] Most of the various hydrating skin products currently on the market contain chemical synthetic substances or pharmaceutical ingredients that can produce toxic side effects, and long-term use will cause new skin problems. Contents of the invention [0...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/98A61K8/97A61Q19/00
Inventor 陆媛媛
Owner 陆媛媛
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap