A low-silicon, low-phosphorus, high-toughness sintered flux for additive manufacturing and its application
A technology of additive manufacturing and sintering flux, applied in the direction of manufacturing tools, welding equipment, welding media, etc., can solve the problems of difficult research and development, no research and patent declaration, etc., and achieve good slag removal and excellent dephosphorization effect, the effect of low phosphorus content
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0034] This embodiment provides a low-silicon, low-phosphorus, high-toughness sintered flux for additive manufacturing, including the following components by weight percentage: MgO: 8%, CaF 2 :31%, Al 2 o 3 : 24%, TiO 2 : 2%, SiO 2 : 12%, CaO: 10%, Na 3 AlF 6 :5%, Li 2 CO 3 : 3%, rare earth fluoride: 1%, light rare earth oxide: 2%, MnO: 2%; wherein, the above-mentioned components contain unavoidable impurities, among which S≤0.01%, P≤0.01%.
[0035] Preparation method: after the re-inspection of the required raw materials of each component is qualified, after sieving, carry out proportioning and weighing according to the above formula, and then put it into a dry blender for dry blending, and put the evenly stirred powder into a wet blender, Add about 18-20% of the weight of the powder into water glass for wet mixing, fully stir evenly, send the stirred powder into the granulator for granulation, and send the granulated flux to the drying furnace after drying. Dry at a ...
Embodiment 2
[0039] This embodiment provides a low-silicon, low-phosphorus, high-toughness sintered flux for additive manufacturing, including the following components by weight percentage: MgO: 15%, CaF 2 :25%, Al 2 o 3 :18%, TiO 2 : 4%, SiO 2 : 16%, CaO: 10%, Na 3 AlF 6 :4%, Li 2 CO 3 : 2%, rare earth fluoride: 3%, light rare earth oxide: 1%, MnO: 2%; wherein, the above-mentioned components contain unavoidable impurities, among which S≤0.01%, P≤0.01%.
[0040] The preparation method is the same as in Example 1.
[0041] Before welding, the sintered flux prepared in this example is dried at 350-400°C for 1 hour and then used for welding test. It is welded with welding wire MCJ3D336F12. Fine and compact, beautifully formed.
[0042] The chemical composition of the welding wire MCJ3D336F12 in this example is shown in Table 1. The low-silicon, low-phosphorus, high-toughness sintered flux for additive manufacturing prepared in this example is deposited with the welding wire MCJ3D336F...
Embodiment 3
[0044] This embodiment provides a low-silicon, low-phosphorus, high-toughness sintered flux for additive manufacturing, including the following components by weight percentage: MgO: 10%, CaF 2 :28%, Al 2 o 3 :21%, TiO 2 : 2%, SiO 2 : 14%, CaO: 13%, Na 3 AlF 6 :3%, Li 2 CO 3 : 2%, rare earth fluoride: 2%, light rare earth oxide: 2%, MnO: 3%; wherein, the above-mentioned components contain unavoidable impurities, among which S≤0.01%, P≤0.01%.
[0045] The preparation method is the same as in Example 1.
[0046] Before welding, the sintered flux prepared in this example is dried at 350-400°C for 1 hour and then used for welding test. It is welded with welding wire MCJ3D336F12. Fine and compact, beautifully formed.
[0047] The chemical composition of the welding wire MCJ3D336F12 in this example is shown in Table 1. The low-silicon, low-phosphorus, high-toughness sintered flux for additive manufacturing prepared in this example is deposited with the welding wire MCJ3D336F...
PUM
| Property | Measurement | Unit |
|---|---|---|
| particle size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 
