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Substrate supporting rod and antistatic liquid coating method

A technology of antistatic liquid and support rod, which is applied to the device, circuit, coating, etc. of the surface coating liquid, which can solve the problems of difficult uniform and comprehensive coating and poor static electricity removal ability, so as to prevent pollution and avoid Effects of physical harm

Active Publication Date: 2017-02-22
HEFEI BOE OPTOELECTRONICS TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The current method is to manually apply antistatic liquid on the surface of the Lift bar, but this method is not only difficult to apply evenly and comprehensively, but also makes the ability of removing static electricity worse, and there are many risks

Method used

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  • Substrate supporting rod and antistatic liquid coating method
  • Substrate supporting rod and antistatic liquid coating method
  • Substrate supporting rod and antistatic liquid coating method

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Embodiment Construction

[0036] The features and principles of the present invention will be described in detail below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the protection scope of the present invention.

[0037] Such as Figure 1-Figure 4 As shown, this embodiment provides a substrate support rod, including:

[0038] The outer support rod 2 is a box structure with an open surface;

[0039] The inner support rod 1 is accommodated in the outer support rod 2 and has a support surface for supporting the substrate;

[0040] A lifting structure for controlling the lifting movement of the inner support rod 1 so that the inner support rod 1 changes between the first state and the second state;

[0041] An antistatic liquid coating structure, used for coating an antistatic liquid on the inner support rod 1 when the inner support rod 1 is in the first state;

[0042] Wherein, the first state is that...

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Abstract

The invention relates to a substrate supporting rod. The substrate supporting rod comprises an outer supporting rod, an inner supporting rod, a lifting structure and an antistatic liquid coating structure, wherein the outer supporting rod adopts a box structure with an opening in one surface; the inner supporting rod is accommodated inside the outer supporting rod, and has a supporting surface for supporting a substrate; the lifting structure is used for controlling the inner supporting rod to do lifting movement so as to change the inner supporting rod between a first state and a second state; the lifting structure comprises a connecting rod running through the bottom of the outer supporting rod so as to support the inner supporting rod; the antistatic liquid coating structure is used for coating antistatic liquid onto the inner supporting rod when the inner supporting rod is in the first state; in the first state, the inner supporting rod is completely positioned inside the outer supporting rod; in the second state, the supporting surface of the inner supporting rod is flush with the surface, having the opening, of the outer supporting rod. The invention further relates to an antistatic liquid coating method. With the antistatic liquid coating method, automatic coating of the antistatic liquid is achieved, and during antistatic liquid coating, pollution to the substrate and the like is prevented and personal hazards are avoided.

Description

technical field [0001] The invention relates to the technical field of liquid crystal product production, in particular to a substrate support rod and a method for coating an antistatic liquid. Background technique [0002] In the process of TFT-LCD (Thin Film Transistor Liquid Crystal Display) field, the exposure machine mainly aligns the film layer on the mask plate and exposes it on the glued glass substrate, and the glass substrate is carried by the base , and the main function of the Liftbar (support rod) is: when Loading (loading) the substrate, the Lift bar rises to receive the substrate sent by the Robot arm (robot arm) into the exposure machine, and then falls to the surface of the abutment to evenly spread the substrate Place it on the surface of the abutment; when Unloading (unloading) the substrate, the Lift bar rises, and after the Robot arm takes the substrate away, it waits for the next substrate to be sent in to continue receiving. [0003] ESD (Electrostati...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13
CPCG02F1/1303H01L21/68742H01L21/67751H01L21/67742B05C1/0813B05C1/0821B05C1/08
Inventor 金宇黄文同张玉虎刘小波苏琦
Owner HEFEI BOE OPTOELECTRONICS TECH
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