Three-dimensional dendritic silicon negative electrode material and preparation method
A technology of three-dimensional dendritic and electrode materials, which is applied in the direction of negative electrodes, battery electrodes, active material electrodes, etc., and can solve problems such as large-volume expansion that cannot be solved
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Embodiment 1
[0019] A method for preparing a three-dimensional dendritic silicon negative electrode material, the specific steps of which are as follows:
[0020] ① Soak the nano-sized silicon particles in an intercalation agent composed of dimethyl sulfone, formamide, and polyethylene glycol for 48 hours to activate the silicon particles, take out the silicon particles and centrifugally dry them to obtain intercalated silicon particles; The pH of the intercalation agent is 7.7-8;
[0021] ② adding the intercalated silicon microparticles of step ① to the molten excessive sodium chloride to disperse;
[0022] ③Quick freezing the molten mixture obtained in step ② through liquid nitrogen to obtain a low-temperature mixture;
[0023] ④ The low-temperature mixture obtained in step ③ is rapidly heated by microwaves to cause the nano-silicon particles to burst, and then cleaned and filtered to obtain the product, namely silicon particles with three-dimensional dendritic cracks.
Embodiment 2
[0025] A method for preparing a three-dimensional dendritic silicon negative electrode material, the specific steps of which are as follows:
[0026] ① Soak the nano-sized silicon particles in an intercalation agent composed of dimethyl sulfone and formamide for 48 hours to activate the silicon particles, take out the silicon particles and centrifugally dry them to obtain intercalated silicon particles; the pH of the intercalation agent is 7.7-8;
[0027] 2. The intercalated silicon particles of step 1. are added to the molten excessive molten mixture composed of sodium chloride and magnesium chloride to disperse;
[0028] ③Quick freezing the molten mixture obtained in step ② through liquid nitrogen to obtain a low-temperature mixture;
[0029] ④ The low-temperature mixture obtained in step ③ is rapidly heated by microwaves to cause the nano-silicon particles to burst, and then cleaned and filtered to obtain the product, namely silicon particles with three-dimensional dendrit...
Embodiment 3
[0031] A method for preparing a three-dimensional dendritic silicon negative electrode material, the specific steps of which are as follows:
[0032] ① Soak the nano-sized silicon particles in a sufficient amount of intercalation agent for 48 hours to activate the silicon particles, take out the silicon particles and centrifugally dry them to obtain intercalated silicon particles; the pH of the intercalation agent is 7.7-8;
[0033] ② adding the intercalated silicon particles of step ① to the molten excess chloride salt to disperse;
[0034] ③Quick freezing the molten mixture obtained in step ② through liquid nitrogen to obtain a low-temperature mixture;
[0035] ④ The low-temperature mixture obtained in step ③ is rapidly heated by microwaves to cause the nano-silicon particles to burst, and then cleaned and filtered to obtain the product, namely silicon particles with three-dimensional dendritic cracks.
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