Semiconductor process simulation device and method, and computing device

Abstract

Provided are a semiconductor process simulation device, a semiconductor process simulation method, and a computing device for performing semiconductor process simulation. The semiconductor process simulation method includes: dividing a semiconductor process simulation into a plurality of blocks based on an annealing simulation; performing a shape simulation corresponding to a block selected from the plurality of blocks; and based on result data of the shape simulation corresponding to the selected block, At least two ion implantation simulations of the plurality of ion implantation simulations corresponding to the selected block are performed in parallel.

Description

[0001] This application claims priority from Korean Patent Application No. 10-2015-0144842 filed on October 16, 2015 at the Korean Intellectual Property Office, the entire contents of which are hereby incorporated by reference. technical field [0002] Embodiments of the present disclosure relate to a semiconductor device, in particular, to a device for simulating a semiconductor process and a simulation method thereof. Background technique [0003] With the high integration and miniaturization of semiconductor devices, the demand for semiconductor process simulation based on physical simulation is increasing in order to overcome the limitations of semiconductor processes and devices and reduce test costs. [0004] Traditional semiconductor schedule simulations are performed sequentially according to the semiconductor schedule. For this reason, the calculation of each step of the semiconductor schedule simulation is performed based on the result information of one or more pr...

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Problems solved by technology

[0005] However, as semiconductor devices become more highly integrated and miniaturized, the amount of time it takes to perform simulation operations using the above-described semiconductor process simulation method is gradually increasing

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