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Fluid collection device for rotary etch cleaner

A collection device and fluid technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as out-of-synchronization of lifting components, and achieve the effect of strengthening horizontal stability and smooth and stable lifting

Active Publication Date: 2019-07-26
GRAND PLASTIC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] In view of this, in order to improve the reliability of the fluid collection device, the object of the present invention is to provide a fluid collection device for a rotary etching cleaning machine, which corresponds to a driving device through each collection ring, which overcomes the problem of using a drive device in the prior art. Multiple pneumatic cylinders are used to raise and lower a collection ring, which may easily cause the problem of out-of-synchronization of lifting components

Method used

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  • Fluid collection device for rotary etch cleaner
  • Fluid collection device for rotary etch cleaner
  • Fluid collection device for rotary etch cleaner

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Embodiment Construction

[0028] Several preferred embodiments of the present invention are described in detail with the help of the accompanying drawings and the following descriptions. In different drawings, the same reference numerals represent the same or similar components.

[0029] Please refer to figure 1 and figure 2 , figure 1 It is a schematic cross-sectional view of a rotary etching cleaning machine platform in a preferred embodiment of the present invention, figure 2 A schematic perspective view of the fluid collection device of this preferred embodiment. As shown in the figure, the fluid collecting device 120 of the rotary etching cleaning machine 100 of this embodiment is used to collect the fluid splashed from the surface of a substrate 10 . In detail, the rotary etching cleaning machine 100 is provided with a stage 11, and a rotating shaft 12 is connected under the stage 11 to carry and rotate the substrate 10, wherein the substrate 10 can be a semiconductor wafer, a display substr...

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Abstract

The invention provides a fluid collection device of a rotary etching and cleaning machine. The fluid collection device is used for collecting fluid splashed from the surface of a substrate, and comprises a plurality of collecting units and a plurality of driving devices, wherein the plurality of collecting units are arranged on the periphery of the substrate; the plurality of driving devices are connected to the plurality of collecting units separately, are used for controlling the ascending and descending of the corresponding collecting units independently, so that the plurality of collecting units can collect different fluids respectively; and the number of the plurality of driving devices is equal to that of the plurality of collecting units. The fluid collection device overcomes the existing problems that a plurality of pneumatic cylinders are adopted and lifting components are asynchronous.

Description

[0001] 【Technical field】 [0002] The invention relates to a fluid collection device, in particular to a fluid collection device suitable for a substrate rotary etching cleaning machine. [0003] 【Background technique】 [0004] In the processes of semiconductor wafers, display substrates, solar substrates, LED substrates, etc., it is necessary to process the substrates, such as supplying processing liquids (such as chemicals or deionized water, etc.) to the surface of the substrates for etching, cleaning and other processing procedures , and in the substrate processing, it is necessary to use a fluid processing device to collect, drain, recycle and other subsequent processing for the used processing liquid. However, most of the waste liquids generated during the etching process are toxic liquids and must be handled with care. Therefore, how to collect and even recycle different waste liquids is an important issue. [0005] The existing rotary etching cleaning machine can refe...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67
CPCH01L21/67017H01L21/67023H01L21/67075
Inventor 许明哲
Owner GRAND PLASTIC TECH