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Device and method for avoiding rotary coating of two-sided solar cell silicon nitride coated film

A technology of solar cells and silicon nitride, which is applied in the field of solar cells, can solve problems such as chromatic aberration, and achieve the effects of simple design, wide application range, and increased resistance

Inactive Publication Date: 2017-05-31
SHANGHAI SHENZHOU NEW ENERGY DEV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If thin slices are to be produced, the position of the gap at the top of the hook will cause edge wrapping, and the chromatic aberration will be caused after the silicon wafer is turned over 180° for coating

Method used

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  • Device and method for avoiding rotary coating of two-sided solar cell silicon nitride coated film
  • Device and method for avoiding rotary coating of two-sided solar cell silicon nitride coated film
  • Device and method for avoiding rotary coating of two-sided solar cell silicon nitride coated film

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Experimental program
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Effect test

Embodiment 1

[0037] A kind of device that solves double-sided solar cell silicon nitride coating wrapping plating, such as figure 1 As shown, it includes a graphite frame 1, several support hooks 2, stop rods 3 and gaskets arranged on the graphite frame 1. Wherein support hook comprises support hook body 21 and hook body 22, as figure 2 As shown, the support hook body 21 is U-shaped, and the two free ends of the top are turned outward by 90° to form a support hook protrusion 24. The bottom is straight, and the two sides are respectively connected to the hook body 22. The hook point 23, the distance from the hook point 23 to the bottom of the support hook body 21 is 4.5mm, the transition at the hook point 23 is smooth, and the bottom of the hook body 22 of the support hook 2 has a suitable rounded corner, so that the hook point and the support hook body 21 The distance is appropriate, so that the hook body 23 is not too close to the edge of the silicon chip 4 or the hook point 23 is too c...

Embodiment 2

[0045] This embodiment is basically the same as Embodiment 1, except that the hook point 23 is flush with the lower surface 11 of the graphite frame in this embodiment.

Embodiment 3

[0047] This embodiment is basically the same as Embodiment 1, except that the hook point 23 is set 1 mm above the lower surface 11 of the graphite frame in this embodiment.

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Abstract

The invention relates to a device and method for avoiding rotary coating of two-sided solar cell silicon nitride coated film. The device comprises a graphite frame and a plurality of supporting hooks arranged on the graphite frame. Each supporting hook comprises a body and a hook body, wherein a hook point is formed at the free end of the hook body and is not lower than the lower surface of the graphite frame but not 1 mm higher than the lower surface of the graphite frame. The hook points of all the supporting hooks are located on the same horizontal plane. During two-sided coating, a to-be-coated silicon wafer obtained through earlier stage processing of a two-sided solar cell technique is put on the supporting devices of the device, the silicon wafer enters the device, one surface of the silicon wafer is coated, and then the silicon wafer with one surface coated is turned by 180 degrees, so that the other surface is coated. Compared with the prior art, the device and method have the advantages that the application range is wide, safety and reliability are achieved, the stability performance is good, overhauling is convenient, the maintenance frequency is low, the technical performance is good, and the problem of edge chromatic aberration caused by rotary coating of the plate-type coated film can be solved.

Description

technical field [0001] The invention belongs to the field of solar cells, and in particular relates to a device and method for solving the problem of wrapping silicon nitride coatings on double-sided solar cells. Background technique [0002] At present, the coating of N-type double-sided solar cells is double-sided deposited silicon nitride anti-reflection film. Coating methods are divided into tube coating and plate coating. Both ways have advantages and disadvantages. Due to the different ways of loading the sheet, there is a problem of wrapping in the plate coating, which leads to chromatic aberration at the edge of the silicon wafer during the production process of the double-sided battery. Compared with the plate type, the tube type coating does not have the problem of edge chromatic aberration. However, the problem of tubular coating is that when the second side is coated, the scratches on the surface of the silicon wafer are more serious than plate PECVD, and it c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/34C23C16/458
Inventor 刘慎思赵钰雪郑飞陶智华马贤芳林佳继张忠卫石磊阮忠立
Owner SHANGHAI SHENZHOU NEW ENERGY DEV
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