The invention relates to a device and method for avoiding rotary coating of two-sided solar cell silicon nitride coated film. The device comprises a graphite frame and a plurality of supporting hooks arranged on the graphite frame. Each supporting hook comprises a body and a hook body, wherein a hook point is formed at the free end of the hook body and is not lower than the lower surface of the graphite frame but not 1 mm higher than the lower surface of the graphite frame. The hook points of all the supporting hooks are located on the same horizontal plane. During two-sided coating, a to-be-coated silicon wafer obtained through earlier stage processing of a two-sided solar cell technique is put on the supporting devices of the device, the silicon wafer enters the device, one surface of the silicon wafer is coated, and then the silicon wafer with one surface coated is turned by 180 degrees, so that the other surface is coated. Compared with the prior art, the device and method have the advantages that the application range is wide, safety and reliability are achieved, the stability performance is good, overhauling is convenient, the maintenance frequency is low, the technical performance is good, and the problem of edge chromatic aberration caused by rotary coating of the plate-type coated film can be solved.