The invention relates to a technical field of
ceramic material metallization production, and specifically relates to an Al3O3
ceramic substrate metallization process. According to the invention, the Al3O3
ceramic substrate is sequentially subjected to a coarsening treatment, a
sensitization and activation treatment, a
chemical plating treatment, and a
metal or
alloy electroplating treatment, such that a
metal or
alloy film is formed on the surface of the substrate. With the process method provided by the invention, the surface of the
ceramic substrate is uniformly coarsened. Microscopic coarse particles are small and have high adsorption capacity. Therefore, reducing cores can be well absorbed during the subsequent
sensitization and activation treatment, and
chemical plating can be finally realized. The coarsened
ceramic substrate can be subjected to the
sensitization and activation treatment with a subsequent silver
ammonia solution, and can be provided with a
copper plating layer with the chemical
copper plating process. Also, the substrate can be subjected to the sensitization and activation treatment with colloidal
palladium, and can be subjected to a
nickel plating process, such that a chemical
nickel plating layer can be obtained.
Copper,
nickel, or other
metal or
alloy can be electroplated, and
ceramic substrate metallization can be realized.