The invention relates to a technical field of 
ceramic material metallization production, and specifically relates to an Al3O3 
ceramic substrate metallization process. According to the invention, the Al3O3 
ceramic substrate is sequentially subjected to a coarsening treatment, a 
sensitization and activation treatment, a 
chemical plating treatment, and a 
metal or 
alloy electroplating treatment, such that a 
metal or 
alloy film is formed on the surface of the substrate. With the process method provided by the invention, the surface of the 
ceramic substrate is uniformly coarsened. Microscopic coarse particles are small and have high adsorption capacity. Therefore, reducing cores can be well absorbed during the subsequent 
sensitization and activation treatment, and 
chemical plating can be finally realized. The coarsened 
ceramic substrate can be subjected to the 
sensitization and activation treatment with a subsequent silver 
ammonia solution, and can be provided with a 
copper plating layer with the chemical 
copper plating process. Also, the substrate can be subjected to the sensitization and activation treatment with colloidal 
palladium, and can be subjected to a 
nickel plating process, such that a chemical 
nickel plating layer can be obtained. 
Copper, 
nickel, or other 
metal or 
alloy can be electroplated, and 
ceramic substrate metallization can be realized.