The invention provides an IC soaking sheet surface micro-texture forming method and device, and relates to the field of
electronic equipment manufacturing. According to the method, aluminum
alloy is put into a
stamping die to be subjected to
stamping forming, and a workpiece with a micro-texture on one face is obtained; the workpiece is transferred to a PVD cavity, vacuumizing is conducted,
inert gas is introduced, a
sputtering power source is turned on, and a
titanium oxide coating and a PTFE-
silicon dioxide
coating are sequentially sputtered and deposited on the face, with the
microstructure, of the workpiece; and turning off a
sputtering power supply, and blanking to obtain the IC soaking sheet. Wherein the aluminum
alloy comprises the following components in percentage by weight: 2%-3% of Si, 0.2%-0.4% of Cu, 0.05%-0.1% of Ti, 0.1%-0.5% of B, 0.03%-0.08% of Sc, 0.02%-0.05% of Sr, less than 0.1% of inevitable impurities and the balance of aluminum. The prepared IC soaking sheet is good in heat conduction performance,
heat transfer can be accelerated, the heat dissipation effect is enhanced, the bonding force between the
sputtering functional
coating and the aluminum
alloy workpiece is high, and stability is good.