Al3O3 ceramic substrate metallization process
A ceramic substrate and metallization technology, applied in the field of metallization of Al2O3 ceramic substrates, can solve the problems of complex W-Mn method process, weak adhesion between substrate and coating, unstable quality of active metal method, etc., and achieves microscopic roughness. Small particles, easy technology transfer, reducing irritation and environmental pollution effects
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Embodiment 1
[0057] Al 2 o 3 The ceramic substrate is cleaned in sequence by running water, degreasing, hot water washing, cold water washing, distilled water washing, roughening treatment, hot water washing, cold water washing, ultrasonic washing, hydrochloric acid etching, sensitization and activation treatment, running water washing, distilled water washing, chemical copper plating treatment, electroplating copper treatment and anti-oxidation treatment to form a copper film on the surface, of which:
[0058] ①. Coarsening treatment is carried out at room temperature for 80 minutes. 1L of roughening treatment solution contains:
[0059] Hydrofluoric acid 100g;
[0060] Ammonium fluoride 205g;
[0061] The balance is deionized water.
[0062] ②. The sensitization and activation treatment is to activate with silver ammonia solution for 15 minutes at room temperature.
[0063] ③. The electroless copper plating process is to treat at 55°C for 30 minutes, the pH of the treatment solution...
Embodiment 2
[0080] Al 2 o 3 The ceramic substrate is cleaned in sequence by running water, degreasing, hot water washing, cold water washing, distilled water washing, roughening treatment, hot water washing, cold water washing, ultrasonic washing, hydrochloric acid etching, sensitization and activation treatment, running water washing, distilled water washing, chemical copper plating Treatment, electroplating gold treatment to form a gold film on the surface, wherein:
[0081] ①. Coarsening treatment is carried out at room temperature for 90 minutes. 1L of roughening treatment solution contains:
[0082] Hydrofluoric acid 105g;
[0083] Ammonium fluoride 215g;
[0084] The balance is deionized water.
[0085] ②. The sensitization and activation treatment is to activate with silver ammonia solution for 20 minutes at room temperature.
[0086] ③. The electroless copper plating process is to treat at 58°C for 25 minutes, the pH of the treatment solution is 12-12.5, and 1L of the treatme...
Embodiment 3
[0096] Al 2 o 3 The ceramic substrates are washed in running water, degreasing, hot water washing, cold water washing, distilled water washing, roughening treatment, hot water washing, cold water washing, ultrasonic washing, hydrochloric acid etching, sensitization and activation treatment, running water washing, distilled water washing, electroless nickel plating treatment, electroplating copper treatment and anti-oxidation treatment to form a copper film on the surface, of which:
[0097] ①. Coarsening treatment is carried out at room temperature for 85 minutes. 1L of roughening treatment solution contains:
[0098] Hydrofluoric acid 110g;
[0099] Ammonium fluoride 215g;
[0100] The balance is deionized water.
[0101] ②. The sensitization and activation treatment is carried out at room temperature for 8 minutes, and 1L of the treatment solution contains:
[0102] 37% hydrochloric acid 280mL;
[0103] Stannous chloride 6g;
[0104] Colloidal palladium concentrate 9m...
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