The present application provides a
solar cell and a preparation method therefor. The
solar cell comprises a
silicon substrate, a front
electrode arranged on a front face of the
silicon substrate, and a back
electrode arranged on a back face of the
silicon substrate. The back face of the silicon substrate comprises a grid line area and a non-grid line area. The back
electrode is arranged in the grid line area. The grid line area is provided with a first passivated contact structure. A tunnel layer, at least one first doped
polycrystalline silicon layer, at least one spacer layer, and a second doped
polycrystalline silicon layer are sequentially stacked on the first passivated contact structure. The passivated contact structure of the
solar cell of the present invention has different film
layers and thicknesses in the grid line area and the non-grid line area. The grid line area is provided with a four-layer structure consisting of the tunnel layer, the first doped
polycrystalline silicon layer, the spacer layer, and the second doped polycrystalline silicon layer, and the grid line area is large in thickness and is provided with two doped polycrystalline silicon
layers, preventing a grid line
slurry from penetrating through the doped polycrystalline silicon layer and damaging an underlying tunnel
oxide layer during
sintering, thereby ensuring a field
passivation effect. The non-grid line area only comprises the tunnel layer and the first doped polycrystalline silicon layer, and is much thinner than the grid line area, thereby reducing parasitic absorption of backlight, and improving
photoelectric efficiency.