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Method and equipment for substrate transportation mechanism in coating cleaning facility and coating facility

A cladding and facility technology, which is applied to substrate transport mechanisms and equipment in cleaning cladding facilities and the field of cladding facilities, and can solve problems such as high cost and long waiting time.

Inactive Publication Date: 2017-07-07
CHINA TRIUMPH INT ENG +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, this cleaning method requires a long waiting time (eg approximately 16 hours) and high costs

Method used

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  • Method and equipment for substrate transportation mechanism in coating cleaning facility and coating facility
  • Method and equipment for substrate transportation mechanism in coating cleaning facility and coating facility
  • Method and equipment for substrate transportation mechanism in coating cleaning facility and coating facility

Examples

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Embodiment Construction

[0043] figure 1 is schematically shown the integration of method step S2 according to the invention into the operation of a cladding plant in which one or more substrates are clad with material. During the coating process of the one or more substrates, one or more parasitic layers or parasitic particles are formed on the surfaces of the transport mechanism which move the one or more substrates in the coating installation ( S 1 ). According to the invention, one or more parasitic layers or particles are removed (S2) from the surface of the transport mechanism directly during the operation of the coating installation, wherein the removal of the parasitic layers or particles takes place continuously or only at defined moments remove. Parasitic layers or particles are removed in coating plants by means of mechanical or thermal detachment processes.

[0044] figure 2A longitudinal section is shown through a coating installation 1 with two exemplary devices 5 for cleaning transp...

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PUM

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Abstract

The invention relates to a method and equipment for a substrate transportation mechanism in a coating cleaning facility and the coating facility. The position of the transportation mechanism in the coating facility is fixed, the transportation mechanism rotates in the coating facility, and the coating facility is provided with at least one of this kind of equipment. In this way, at least on one zone of the transportation mechanism, under the condition that the process that parasitism layers or particles are separated from the transportation mechanism is used, the transportation mechanism is cleaned in the coating facility running period and inside the coating facility; through a thermotic separating process or a mechanical separating process, the parasitism layers or particles are separated from the transportation mechanism; and in the thermotic separating process, the transportation mechanism is locally and strongly heated, namely the parasitism layers or particles evaporate from the surface of the transportation mechanism.

Description

technical field [0001] The invention relates to a method and a device for cleaning a substrate transport mechanism in a cladding plant during operation of the cladding plant and to such a cladding plant. Coating systems are used, for example, in the semiconductor industry, in the manufacture of solar cells and in particular in the production of liquid crystal displays or special glazing, to apply material layers to flat semiconductor substrates, glass substrates or other substrates. Background technique [0002] For depositing thin material layers on glass substrates or other plate-shaped or flat substrates, mainly continuously operating coating facilities are used, such as sputtering facilities, CVD facilities (Chemical Vapor Deposition), especially also Plasma CVD systems or thermal evaporation systems, in particular also CSS systems (Closed-Space Sublimation) are used. In these installations, the substrate to be coated is supported, for example, on shafts or rollers and ...

Claims

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Application Information

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IPC IPC(8): C23C16/44C23C14/56
CPCC23C14/564C23C16/4407C23C14/56C23C16/44
Inventor 米夏勒·哈尔彭寿
Owner CHINA TRIUMPH INT ENG