Design method for wide-angle extreme ultraviolet Mo/Si multi-layer membrane on the basis of quantum evolutionary algorithm

Abstract

The invention discloses a design method for a wide-angle extreme ultraviolet Mo / Si multi-layer membrane on the basis of a quantum evolutionary algorithm, belongs to the field of extreme ultraviolet multi-layer membrane development and research, and solves the problems of large population scale, complex calculation process and low solving efficiency since a genetic algorithm is generally adopted to optimize a design process in wide-angle extreme ultraviolet multi-layer membraned design. The method comprises the following steps that: 1) inputting an initial extreme ultraviolet multi-layer membrane parameter value of the quantum evolutionary algorithm; 2) carrying out quantum encoding on the multi-layer membrane parameter value, and generating a quantum chromosome population; 3) calculating the fitness of each multi-layer membrane system, and selecting an optimal membrane system structure; 4) carrying out evolutionary judgment, meeting an optimization criterion, outputting an optimal multi-layer membrane system structure, stopping the algorithm, and otherwise, continuously carrying out evolution; and 5) through complementary variation and discrete crossover, updating the multi-layer membrane system of quantum encoding, turning to the S3). The method is suitable for wide-angle extreme ultraviolet multi-layer membrane system optimization design and has the advantages of small population scale, high rate of convergence and high solving efficiency.

Description

technical field [0001] The invention belongs to the field of research and development of extreme ultraviolet multilayer films, and in particular relates to a design method of a wide-angle high-reflectivity extreme ultraviolet Mo / Si multilayer film based on a quantum evolution algorithm. Background technique [0002] In the extreme ultraviolet (Extreme Ultraviolet) band, the refractive index of almost all substances is close to 1 and has strong absorption, so the traditional transmission optical system cannot be used, but the reflective optical system based on the extreme ultraviolet multilayer film is used. In order to achieve high reflectivity, the surface of the reflective optical element must be coated with a multilayer film with a thickness of nanometers. Therefore, the extreme ultraviolet multilayer film is an important optical element in the optical system. It is used in extreme ultraviolet astronomy, extreme ultraviolet spectroscopy, Research fields such as extreme ul...

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Problems solved by technology

[0004] In order to solve the problems existing in the prior art, the present invention provides a design method of a wide-angle EUV Mo / Si multilayer film based on a quantum evolutionary algorithm, which solves the problems in the design of a wide-angle extreme ultraviolet multilayer film in the existing algorithm. The problem of large population size, slow convergence speed and complex calculation process

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