Ultrasonic wave cleaning device for silicon wafer
A cleaning device, ultrasonic technology, applied in the direction of cleaning methods and appliances, cleaning methods using liquids, chemical instruments and methods, etc., can solve the problems of reducing the quality of silicon wafers and impurities that cannot be cleaned, and achieve high cleaning efficiency and good cleaning Effect
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[0016] Example
[0017] Such as Figure 1-3 As shown, an ultrasonic cleaning device for silicon wafers includes a frame 1 having a cleaning tank 101. The frame 1 is rotatably provided with a bottom plate 2 located in the cleaning tank 101 and on the bottom plate 2 An ultrasonic transducer 3 is provided. The ultrasonic transducer 3 is connected with the ultrasonic generator, and the ultrasonic transducer 3 is controlled by the ultrasonic generator. The frame 1 is provided with a first driving device for driving the bottom plate 2 to swing 4. The cleaning tank 101 is provided with a frame 5 for placing the insert box, the frame 5 is located above the bottom plate 2, and the frame 1 is provided with a swing mechanism for driving the frame 5 to swing.
[0018] The swing mechanism includes a connecting rod group arranged on the frame 1, the connecting rod group is arranged on both sides of the frame 5, and the connecting rod group is composed of two connecting rods 6 arranged parallel ...
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