Simple polishing solution flow control and supply device and control method thereof
A technology of flow control device and supply device, which is applied in the direction of grinding/polishing equipment, manufacturing tools, metal processing equipment, etc., to achieve the effect of being economical and practical, easy to use, and reducing cleaning difficulties
Active Publication Date: 2017-08-29
KUNMING UNIV OF SCI & TECH
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Problems solved by technology
[0003]
The invention provides a simple polishing liquid flow control supply device and its control method, which are used to realize the problems of polishing liquid absorption and flow control in experiments
Method used
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Embodiment 1
[0025] Embodiment 1: as Figure 1-6 As shown, a simple polishing liquid flow control supply device includes a polishing liquid extraction part, a control part 11, a flow control device 12, a turbine flow meter 13 and an execution device 15; the control part 11 is connected to the polishing liquid extraction part through a data line , a flow control device 12, a turbine flowmeter 13, and the execution device 15 is connected to the flow control device 12 through a gate line 26, and the execution device 15 is set outside the conduit II 14 of the polishing liquid extraction part;
[0026] The polishing liquid extraction part includes a test bench 1, a polishing liquid container 2, a conduit I4, a buffer container 5, a plug cover 6, a gas pipe I7, an electromagnetic reversing valve 8, a gas pipe II9, a small air pump 10, a conduit II14, and a conduit III16; The control part 11 is connected to the electromagnetic reversing valve 8 and the air pump 10 through the data line. The buffe...
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The invention relates to a simple polishing solution flow control and supply device and a control method thereof. The device comprises a polishing solution extraction part, a control part, a flow control device, a turbine flowmeter and an execution device, wherein the control part is connected to the polishing solution extraction part, the flow control device and the turbine flowmeter through data lines, and the execution device is connected to the flow control device through a brake cable and is arranged outside a guide pipe II of the polishing solution extraction part in a sleeving mode. According to the simple polishing solution flow control and supply device and the control method thereof, the device is simple in structure, economical, practical and convenient to use; polishing solution suction and flow control can be effectively realized; and parts of the device can be disassembled and replaced, and therefore the cleaning difficulty can be reduced.
Description
technical field [0001] The invention relates to a simple polishing fluid flow control supply device and a control method thereof, belonging to the technical field of material machining. Background technique [0002] With the continuous improvement of green energy, integrated circuits and other technologies, the requirements for the surface flatness of substrate materials are becoming more and more stringent. At the same time, the requirements for material removal rate in polishing behavior are also increasing, and chemical mechanical polishing technology is widely used. In the process of chemical mechanical polishing, the polishing liquid has a great influence on the requirements of surface quality and material removal rate. In order to obtain a polishing liquid with better effect, a large number of experiments are required. During a large number of experiments, there are strict requirements on the flow rate of the polishing liquid, the addition time and other factors. At th...
Claims
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IPC IPC(8): B24B57/02
CPCB24B57/02Y02P70/10
Inventor 冷智毅杨晓京袁锐波蒋红海钱俊兵
Owner KUNMING UNIV OF SCI & TECH