Ti-doped cro2 epitaxial thin film and preparation method thereof
An epitaxial thin film, quality technology, applied in the field of materials, can solve the problems of not expanding the preparation temperature, poor thermal stability, film formation rate, etc., and achieve the effect of increasing the upper limit of the preparation temperature range, improving thermal stability, and wide application range
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Embodiment 1
[0026] A Ti-doped CrO 2 The preparation method of epitaxial film, the preparation method described in this embodiment comprises the following steps:
[0027] Step 1, with 80 parts of quality CrO 3 and 15 parts by mass of TiF 4 After mixing evenly, put it into a quartz boat, then put the quartz boat into the low temperature zone of the double-temperature tube furnace, and put the TiO 2 The single crystal substrate is placed in the high temperature zone of the dual temperature zone tube furnace;
[0028] Step 2, continuously feed O into the tube furnace at a flow rate of 160mL / min 2 Under certain conditions, heat the high temperature zone to 390°C and start keeping warm;
[0029] Step 3: When the high-temperature zone starts to keep warm, start heating the low-temperature zone, heat the low-temperature zone to 310 ° C, and then keep the high-temperature zone and low-temperature zone for 1 hour, the CrO in the quartz boat 3 and TiF 4 vaporized and with O 2 The gas flow ent...
Embodiment 2
[0031] A Ti-doped CrO 2 The preparation method of epitaxial film, the preparation method described in this embodiment comprises the following steps:
[0032] Step 1, with 80 parts of quality CrO 3 and 15 parts by mass of TiF 4 After mixing evenly, put it into a quartz boat, then put the quartz boat into the low temperature zone of the double-temperature tube furnace, and put the TiO 2 The single crystal substrate is placed in the high temperature zone of the dual temperature zone tube furnace;
[0033] Step 2, continuously feed O into the tube furnace at a flow rate of 160mL / min 2 Under certain conditions, heat the high temperature zone to 430°C and start keeping warm;
[0034] Step 3: When the high-temperature zone starts to keep warm, start heating the low-temperature zone, heat the low-temperature zone to 310°C, and then keep the high-temperature zone and low-temperature zone for 1.5 hours. The CrO in the quartz boat 3 and TiF 4 vaporized and with O 2 The gas flow en...
Embodiment 3
[0036] A Ti-doped CrO 2 The preparation method of epitaxial film, the preparation method described in this embodiment comprises the following steps:
[0037] Step 1, with 80 parts of quality CrO 3 and 15 parts by mass of TiF 4 After mixing evenly, put it into a quartz boat, then put the quartz boat into the low temperature zone of the double-temperature tube furnace, and put the TiO 2 The single crystal substrate is placed in the high temperature zone of the dual temperature zone tube furnace;
[0038] Step 2, continuously feed O into the tube furnace at a flow rate of 160mL / min 2 Under certain conditions, heat the high temperature zone to 450°C and start keeping warm;
[0039] Step 3: When the high-temperature zone starts to keep warm, start heating the low-temperature zone, heat the low-temperature zone to 310°C, and then keep the high-temperature zone and low-temperature zone for 2 hours, the CrO in the quartz boat 3 and TiF 4 vaporized and with O 2 The gas flow ente...
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