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A selective infrared radiator

An infrared radiator and selective technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problem of reducing the selective radiation characteristics of devices, and achieve the effect of improving photoelectric conversion efficiency

Active Publication Date: 2019-01-25
SHAOXING UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the rare earth oxide film cannot completely shield the gray body radiation from the substrate, the radiation spectrum of the radiator includes part of the gray body radiation spectrum, thereby reducing the selective radiation characteristics of the device.

Method used

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Embodiment 1

[0021] figure 1 Shown is a schematic cross-sectional structure diagram of the selective infrared radiator provided by Embodiment 1 of the present invention. figure 2 Shown is the one-dimensional Si / Er with different periodic structures provided by Embodiment 1 of the present invention 2 o 3 Transmission spectra of photonic crystals. image 3 Shown is the infrared radiation spectrum at 800° C. of radiators with different film thicknesses provided by Embodiment 1 of the present invention.

[0022] like figure 1 As shown, the selective infrared radiator provided by the present invention includes a silicon base material 1, an erbium oxide thick film 2 deposited on the base material, and a one-dimensional Si / Er deposited on the erbium oxide thick film 2 o 3 Photonic crystal 3. One-dimensional Si / Er 2 o 3 The photonic crystal 3 is composed of alternately deposited silicon thin films 4 and erbium oxide thin films 5 , and each layer of silicon thin films 4 and one layer of er...

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Abstract

The present invention provides a selective infrared radiator. The selective infrared radiator comprises base material silicon, an erbium oxide thick film deposited on the base material and one-dimensional Si / Er2O3 photonic crystal deposited on the erbium oxide thick film. The one-dimensional Si / Er2O3 photonic crystal consists of silicon thin films and erbium oxide thin films deposited on the erbium oxide thick film alternately. According to the selective infrared radiator, an extreme narrow selective infrared radiation spectrum can be required, and thus the photoelectric conversion efficiency of a TPV system is substantially improved.

Description

technical field [0001] The invention belongs to the field of infrared radiation devices, in particular to a selective infrared radiator. Background technique [0002] Selective radiators have important applications in thermophotovoltaic (TPV) systems, and optimizing the infrared thermal radiation performance of selective radiators is of great significance for improving the photoelectric conversion efficiency of the system. Er 2 o 3 , Yb 2 o 3 Rare earth oxides can produce narrow-band infrared characteristic radiation at high temperatures, and are an important class of selective radiator materials. Among them Er 2 o 3 The energy center of photons generated by electronic transitions is 0.805eV (1540nm), which matches the absorption spectrum of GaSb (bandgap 0.72eV) photocells. However, the rare earth oxide block has poor thermal shock resistance and is not suitable for use as a selective radiator alone. In recent years, many researchers have obtained selective radiator...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/054H01L31/055
CPCY02E10/52
Inventor 谭永胜李秀东方泽波刘士彦
Owner SHAOXING UNIVERSITY
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