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A Method of Adaptively Defining Scanning Area of ​​Defect Scanning Equation

A scanning area and defect scanning technology, applied in semiconductor/solid-state device testing/measurement, electrical components, circuits, etc., can solve problems such as inaccuracy, misjudgment of problems, inaccurate feedback in scanning area, etc., to avoid inaccurate scanning area Effect

Active Publication Date: 2020-02-21
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The present invention proposes a method for self-adaptively defining the scanning area of ​​the defect scanning equation, aiming at the method of redefining the scanning area accurately when the graphics of different process layers vary greatly, so as to avoid inaccurate defect feedback caused by insufficient scanning area and causing problems misjudgment

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  • A Method of Adaptively Defining Scanning Area of ​​Defect Scanning Equation
  • A Method of Adaptively Defining Scanning Area of ​​Defect Scanning Equation
  • A Method of Adaptively Defining Scanning Area of ​​Defect Scanning Equation

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Embodiment Construction

[0020] The specific embodiments of the present invention are given below in conjunction with the accompanying drawings, but the present invention is not limited to the following embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in very simplified form and use imprecise ratios, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.

[0021] Please refer to figure 1 , figure 1 Shown is a flow chart of a method for adaptively defining a scanning area for a defect scanning equation in a preferred embodiment of the present invention. The present invention proposes a method for adaptively defining the scanning area of ​​a defect scanning equation, comprising the following steps:

[0022] Step S100: define the scanning area according to different functions of the device, and set different sca...

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Abstract

The invention provides a method for adaptively defining the scanning areas of a defect scanning formula, comprising the following steps: defining scanning areas according to the different functions of devices, and setting different scanning parameters; analyzing data reflected during graphics and light intensity debugging of the different areas defined, taking the data as characteristics for distinguishing different areas, and recording the data; during establishment of a defect scanning formula for a subsequent process layer, increasing graphics and light intensity analysis of the current layer, and redefining different scanning areas according to the characteristics shown by the different areas before; and if the previously-recorded area characteristics cannot be mapped, giving a system prompt indicating that new scanning areas should be defined. According to the method for adaptively defining the scanning areas of a defect scanning formula presented by the invention, scanning areas are redefined accurately under great graphics change of different process layers, and the problem that inaccurate defect feedback and problem misjudgment are caused due to inaccurate scanning areas is avoided.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuit manufacturing, and in particular to a method for adaptively defining the scanning area of ​​a defect scanning equation. Background technique [0002] In recent years, with the rapid development of semiconductor integrated circuits and the scaling down of critical dimensions, their manufacturing processes have become increasingly complex. At present, the advanced integrated circuit manufacturing process generally contains hundreds of process steps, and a problem in one of the steps will cause the problem of the entire semiconductor integrated circuit chip, and may even lead to the failure of the entire chip, so in the manufacture of semiconductor integrated circuits In the process, it is particularly important to discover the problems existing in the product manufacturing process in a timely manner. Based on the above considerations, the industry generally uses defect detection to c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/66
CPCH01L22/12H01L22/20
Inventor 成智何广智柳祚钺黄莉晶
Owner SHANGHAI HUALI MICROELECTRONICS CORP