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Valve closing device and valve closing method

A technology for closing devices and valves, applied in valve devices, valve operation/release devices, valve details, etc., can solve the problems of reducing production rate, long buffer distance and time, reducing the air intake rate of the air inlet 200, etc., to achieve The effect of improving product quality

Active Publication Date: 2019-01-22
CHANGSHA HKC OPTOELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

like figure 1 Shown is the existing valve closing device, including: a hollow casing 100, an air inlet 200 penetrating the bottom of the casing 100, a transmission device 300 exposed on the top of the casing 100 and one end extending into the casing 100, the valve needs to be closed When the gas is passed into the air inlet 200, the transmission device 300 moves upward, thereby closing the valve. When the valve starts to close, the air intake rate of the air inlet 200 is increased, and when the valve is about to be completely closed, the air intake rate is reduced. The air intake rate of the port 200, so that the valve of the coating equipment is slowed down and closed, another existing valve closing device, in figure 1 On the basis of the valve closing device shown, a plurality of air inlets 200 connected to air pipes of different pipe diameters are arranged at the bottom of the housing 100. When the valve is just beginning to close, the air pipes with large pipe diameters are used to inhale air, and when the valve is about to be completely closed At the same time, the air pipe with a small diameter is used to enter the air, so that the valve of the coating equipment is closed at a reduced speed. However, these two valve closing devices both throttle the air inlet 200. In order to ensure that particles will not be generated due to collision when the valve is closed, it is necessary to Only a long buffer distance and time can realize the closing of the valve at reduced speed. The low closing speed of the valve will have a certain negative impact on the production time (tacttime), reduce the production rate and increase the production cost.

Method used

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  • Valve closing device and valve closing method
  • Valve closing device and valve closing method
  • Valve closing device and valve closing method

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Embodiment Construction

[0031] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0032] see figure 2 , is the first embodiment of the valve closing device of the present invention, the valve closing device of the present invention is used to close the valve of the vacuum coating equipment, comprising: a hollow shell 10, a first air inlet 20 that runs through the bottom of the shell 10 , the resisting portion 30 provided on the inner peripheral surface of the housing 10 , the second air inlet 40 penetrating through the side wall of the housing 10 and above the resisting portion 30 , the sealing disc located between the resisting portion 30 and the bottom of the housing 10 50. The transmission device 60 exposed on the top of the casing 10 and one end protruding into the casing 10; one end of the transmission device 60 protr...

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Abstract

The invention provides a valve closing device and method. The valve closing device comprises a shell, a first gas inlet, a butting part, a second gas inlet, a sealing disk and a transmission device, wherein the first gas inlet penetrates through the bottom of the shell; the butting part is arranged on the inner circumferential face of the shell; the second gas inlet penetrates through the side wall of the shell and is located above the butting part; the sealing disk is located between the butting part and the bottom of the shell; and the transmission device is exposed out of the top of the shell and one end of the transmission device stretches into the shell. By connecting gas with the flow being a first flow into the first gas inlet, the sealing disk is pushed to move upwards to abut against the butting part, meanwhile, the end, stretching into the shell, of the transmission device is pushed to move upwards to a first position located above the second gas inlet, and a valve is driven to be closed quickly; and then gas with the flow being a second flow is connected into the second gas inlet, the end, stretching into the shell, of the transmission device is pushed to move upwards continuously from the first position, the valve is driven to be closed slowly until the valve is closed completely, particles caused due to collision in the valve closing process are avoided while the closing rate of the valve is guaranteed, and the product quality is improved.

Description

technical field [0001] The invention relates to the field of display device manufacturing process, in particular to a valve closing device and a valve closing method. Background technique [0002] Thin Film Transistor (TFT) is currently the main driving element in Liquid Crystal Display (LCD) and Organic Light-Emitting Diode (AMOLED), and is directly related to high-performance flat panel display devices. direction of development. Therefore, whether it is an LCD display panel or an OLED display panel, it usually has a TFT substrate. Taking the LCD display panel as an example, it is mainly composed of a TFT substrate, a color filter (Color Filter, CF) substrate, and a liquid crystal layer (Liquid Crystal Layer) arranged between the TFT substrate and the CF substrate. The principle is to control the rotation of the liquid crystal molecules in the liquid crystal layer by applying a driving voltage on the TFT substrate and the CF substrate, and refract the light from the backl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F16K31/122
CPCF16K31/1225
Inventor 李宪朋
Owner CHANGSHA HKC OPTOELECTRONICS CO LTD