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A kind of cleaning agent, its preparation method and application

A cleaning agent and solvent technology, applied in the field of cleaning agents, can solve the problems of ineffective removal of tantalum nitride and poor effect of tantalum-containing etching mask materials, etc., and achieve broad market application prospects, good cleaning efficiency, and high economy benefit effect

Active Publication Date: 2019-08-09
SHANGHAI SINYANG SEMICON MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The technical problem to be solved by the present invention is to provide a cleaning agent for overcoming the defects that existing cleaning agents have poor effect on etching mask materials containing tantalum (such as tantalum nitride), and tantalum nitride cannot be effectively removed. Agents, their preparation methods and applications

Method used

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  • A kind of cleaning agent, its preparation method and application
  • A kind of cleaning agent, its preparation method and application
  • A kind of cleaning agent, its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0031] In the following examples and comparative examples, the preparation method of the cleaning agent includes the following steps: mixing the corresponding raw materials.

[0032] In the following examples, those that do not limit the specific operating temperature all refer to carrying out at room temperature.

Embodiment 1-10

[0034] Each raw material component of table 1 cleaning agent

[0035]

[0036]

[0037] The mass fraction of each raw material component of table 2 and cleaning agent pH value

[0038]

[0039]

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PUM

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Abstract

The invention discloses a detergent, and a preparation method and an application thereof. The preparation method of the detergent is characterized in that raw materials are mixed to obtain the detergent, the raw materials comprise, by mass, 0.5-20% of an iodine-containing oxidant, 0.5-20% of a boron-containing etchant, 1-50% of a pyrrolidone solvent, 1-20% of a corrosion inhibitor, and 0.01-5% of a metal ion-free surfactant and water, and the mass fraction sum of all above components is 100%; the pH value of the detergent is 7.5-13.5; and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitors and a thiocarbohydrazone corrosion inhibitor. The detergent prepared through the preparation method has a good cleaning effect and a good cleaning effect when applied to the cleaning of etched and ashed semiconductor chips.

Description

technical field [0001] The invention relates to a cleaning agent, its preparation method and application. Background technique [0002] During dual damascene processing of integrated circuits, photolithography is used to image patterns on device wafers. Photolithography includes coating, exposure and development steps. The wafer is coated with a positive or negative photoresist substance and then covered with a mask that defines the pattern to be retained or removed in subsequent processes. Once the mask is in place, the mask has directed a beam of monochromatic radiation, such as ultraviolet (UV) light or deep UV (DUV) light (≈250 nm or 193 nm) through the mask so that the exposed photoresist material or More or less soluble in the rinse solution of choice. The soluble photoresist material is then removed, or "developed," leaving the same pattern as the mask. [0003] Subsequently, vapor plasma etching is used to transfer the pattern of the developed photoresist coating...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C11D1/22C11D1/66C11D3/04C11D3/26C11D3/28C11D3/34C11D3/39C11D3/60
CPCC11D1/22C11D1/66C11D3/042C11D3/046C11D3/26C11D3/28C11D3/349C11D3/3942C11D11/0047
Inventor 王溯蒋闯冯强强
Owner SHANGHAI SINYANG SEMICON MATERIALS