exposure machine

Abstract

The invention provides an exposure machine. A transparent protection cover encircling a light source lamp room and an illuminating lens group is arranged outside an exposure chamber, a space with clean indoor air for isolating external environment is provided for the light source lamp room and the illuminating lens group, and the transparent protection cover is connected and communicated with a first gas delivery pipeline. Gas is delivered into the transparent protection cover by the first gas delivery pipeline, so that the light source lamp room and the illuminating lens group are cooled, and the problem of atomization of an external lens of the exposure chamber as the light source lamp room and the illuminating lens group are cooled by directly extracting the clean indoor air in the prior art can be avoided, so that the light source lamp room and lenses of the illuminating lens group can be protected, an expensive high-pressure mercury lamp or lens can be saved, and the production cost is effectively lowered.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an exposure machine. Background technique [0002] In the field of display technology, flat-panel displays such as Liquid Crystal Display (LCD) and Organic Light Emitting Diode (OLED) have gradually replaced CRT displays, and are widely used in LCD TVs, mobile phones, personal digital assistants, digital Cameras, computer or laptop screens, etc. [0003] During the manufacturing process of LCD and OLED, the patterning process is utilized many times. Specifically, a mask is placed on the substrate coated with photoresist, and then an exposure machine is used to expose the substrate. Specifically, the exposure machine emits UV ultraviolet light by turning on an ultra-high pressure mercury lamp, and transfers the image information on the mask to the substrate coated with photoresist. On the substrate surface of the glue, based on the pattern of the mask, the photoresist will have...

AI Technical Summary

Problems solved by technology

[0005] However, during the exposure process, since the photoresist on the substrate will generate volatile gases, the concentration of volatile gases such as organics, acids, and alkalis in the clean room will increase as the process progresses, and the light source lamp room, And the lighting system mirror group is cooled by extracting the air in the clean room. When the volatile gases of these organic substances, acids, and alkalis meet the lampshade and lampshade of the light source lamp room for protecting the high-pressure mercury lamp and concentrating When these lenses of the lighting system lens group, salts will be produced and attached to the lenses, resulting in fogging of the lampshade and lighting system lenses

[0006] Furthermore, when the lampshade of the exposure machine and the lens of the lighting system lens group are fogged, the light transmittance of the lens will decrease, and the illuminance of the exposure machine will also decrease. When the illuminance of the exposure machine decreases, the production capacity will be affected. If we want to maintain If the same illuminance does not affect the production capacity, it is necessary to increase the output value of the high-pressure mercury lamp, which will shorten the life of the high-pressure mercury lamp. Due to the high unit price of the high-pressure mercury lamp, this will further increase the production cost, or replace the atomized lamp. lenses, which will also increase production costs, and if the air in the entire clean room is to be kept clean, the production costs required are even greater

At present, the solution used by some manufacturers is to connect the gas filtered by the chemical filter from the outside of the factory, and directly supply it to the exposure machine cavity, but this solution cannot protect the lampshade outside the exposure cavity and the lens of the lighting system.

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