Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double-faced pile fabric piece split-splicing method and fabric piece split-splicing structure

A technology of double-sided fleece and fabric sheets, which is applied in the field of clothing, can solve the problems of obvious uneven seams, uneven stitching marks, and affecting the aesthetics of clothing, so as to achieve flat seams and thin seams. , Stitching seams flat and the effect

Active Publication Date: 2017-11-24
李建刚
View PDF14 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Secondly, please refer to the attached Figure 5, in the single seam In the splicing part of splicing technology, the boundary between the two-layer double-sided fleece fabric layer (left side) and the non-two-layer double-face fleece fabric layer (right side) has obvious differences caused by height differences. Boundary; that is, the stitching parts of the single seam stitching technology are uneven and the stitching marks are too obvious. Too many obvious stitching marks will make the whole garment messy and complicated, which will affect the overall aesthetics of the garment
[0004] To sum up, there are two technical problems in the single seam stitching technology of conventional double-faced suede fabric pieces: thick seam thickness and obvious uneven seam traces

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-faced pile fabric piece split-splicing method and fabric piece split-splicing structure
  • Double-faced pile fabric piece split-splicing method and fabric piece split-splicing structure
  • Double-faced pile fabric piece split-splicing method and fabric piece split-splicing structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] The present invention will be further explained below in conjunction with the accompanying drawings.

[0031] In the present invention, terms such as "first, second" and "A, B" introduced are only for the convenience of expression to distinguish and identify, and they should not be understood as special limiting requirements for the sequence and the like.

[0032] 1. Conventional technology - single seam splicing method

[0033] see Figure 1 ~ Figure 4 , a systematic display of the splicing process of the single-seam splicing method, Figure 5 A schematic diagram of the cross-sectional structure of two pieces of fabric spliced ​​by the single seam splicing method is shown.

[0034] The specific steps of the single seam splicing method are as follows: see figure 1 Firstly, the spliced ​​part of the first cut piece 1-1 is split into a two-layer structure, and the two-layer structure is respectively the first layer sheet 1-11 and the second layer sheet 1-12. see next...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of clothing, and particularly provides a split splicing technique, including a double-faced pile fabric piece split-splicing method and a fabric piece split-splicing structure. According to the split-splicing technique, both splicing parts of two double-faced pile fabric pieces to be spliced are split into two layers, the two splicing layers of the double-faced pile fabric pieces are spliced with each other and fixed by stitching. The split-splicing technique has the advantages that the splicing parts are thin and the splicing stitch is flat and shallow. Tenderness and elegance of women can be shown completely when women wear the dresses made by the split-splicing technique. Further, the split-splicing technique is also applicable to making men' formal wear.

Description

technical field [0001] The invention belongs to the technical field of clothing, and in particular relates to a double-slit splicing method for a double-faced suede fabric sheet and a double-slit splicing structure for the fabric sheet. Background technique [0002] With the development of modern society, people have more and more types of clothing, and their requirements for the beauty of clothing are also getting higher and higher. Most of the existing clothing cannot be directly cut from a piece of cloth, and often requires multiple pieces of cloth to be spliced ​​into different functional parts. [0003] Double-faced fleece is also called double-faced fabric, which generally refers to fabrics that are piled or raised on both sides. attached Figure 1~4 Shows the splicing process of conventional double-faced fleece fabrics. Taking the splicing of two double-faced fleece fabrics as an example, the splicing part of one of the fabrics is split into two layers, and then the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D05B35/02D05B35/08
CPCD05B35/02D05B35/08
Inventor 李建刚
Owner 李建刚
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com