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Exposure machine control method, exposure machine control system and storage medium

A control method and control system technology, applied in the field of exposure equipment, can solve problems such as exposure machine crashes and lower production efficiency, and achieve the effect of improving production efficiency and reducing the probability of crashes

Active Publication Date: 2017-12-01
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when the replacement of the photomask is not completed and the next batch of glass substrates enters the exposure machine, it will cause the exposure machine to crash and reduce production efficiency

Method used

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  • Exposure machine control method, exposure machine control system and storage medium
  • Exposure machine control method, exposure machine control system and storage medium
  • Exposure machine control method, exposure machine control system and storage medium

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Embodiment Construction

[0022] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0023] The terms "first", "second", "third" and "fourth" in the description and claims of the present invention and the drawings are used to distinguish different objects, rather than to describe a specific order . Furthermore, the terms "include" and "have", as well as any variations thereof, are intended to cover a non-exclusive inclusion. For example, a process, method, system, product or device comprising a series of steps or units is not limited ...

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Abstract

The invention provides an exposure machine control method. The exposure machine control method includes steps of sensing a monitoring signal to monitor if a light cover in the exposure machine is required to replace when there is a preset distance between a to-be-processed substrate and a substrate inlet of the exposure machine; when the light cover in the exposure machine is required to replace, judging if the light cover in the exposure machine is replaced; when the light cover in the exposure machine is replaced, delivering the to-be-processed substrate to the exposure machine. The control method provided by the invention has the advantage of improving the production efficiency of the exposure machine. The invention further provides an exposure machine control system and a storage medium.

Description

technical field [0001] The invention relates to the field of exposure equipment, in particular to an exposure machine control method, an exposure machine control system and a storage medium. Background technique [0002] In the prior art, the production process of exposure and development includes the following steps: cleaning the glass substrate, coating the photoresist, baking, entering the exposure machine, then using a mask to define patterns on the photoresist on the glass substrate, and finally going through the development process Display graphics. When the previous batch of glass substrates flows out of the exposure machine and the next batch of glass substrates enters the exposure machine, the system selects the corresponding photomask according to the information of the glass substrate, that is, at this time, the photomask needs to be replaced. Remove the original photomask, and move the new photomask from the storage slot of the exposure machine to the working po...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70733G03F7/70975
Inventor 胡炳煌
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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