Metal meshed plate and evaporation mask device

A technology of metal stencil and evaporation method, which is applied in vacuum evaporation plating, metal material coating process, sputtering plating, etc., can solve the deformation of the mesh on the surface of the metal stencil, which affects the accuracy of evaporation and the mesh Problems such as the reduction of alignment accuracy with pixels, to achieve the effect of improving accuracy and ensuring alignment accuracy

A technology of metal stencil and evaporation method, which is applied in vacuum evaporation plating, metal material coating process, sputtering plating, etc., can solve the deformation of the mesh on the surface of the metal stencil, which affects the accuracy of evaporation and the mesh Problems such as the reduction of alignment accuracy with pixels, to achieve the effect of improving accuracy and ensuring alignment accuracy

CN107460436AInactive Publication Date: 2017-12-12WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
5 Cites 15 Cited by

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Metal meshed plate and evaporation mask device
  • Metal meshed plate and evaporation mask device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are only for reference The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar elements are denoted by the same reference numerals.

[0034] In the existing metal mask device, the metal stencil is prone to wrinkles during the stretching process, which will lead to the deformation of the mesh on the surface of the metal stencil, the reduction of the alignment accuracy between the mesh and the pixel, and ultimately affect the accuracy of the evaporation technology. problem, this embodiment can solve th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a metal meshed plate comprising a first area, a second area and a third area, wherein the first area is located on the surface of the metal meshed plate and comprises first through holes distributed in an array manner, the second area comprises second through holes distributed in an array manner, the second through holes are arranged around the first area, and the third area comprises third through holes which are distributed in an array manner and arranged around the second area. The metal meshed plate has the beneficial effects that the surface of the metal meshed plate is provided with a deformation absorption area, in the meshed plate stretching technology, the metal meshed plate is continuously adjusted and stretched, wrinkles, corresponding to the display area, of the metal meshed plate can be transferred to the deformation absorption area, it is guaranteed that the alignment precision between the metal meshed plate and pixels is guaranteed, and then the accuracy of substrate evaporation is improved.

Description

technical field [0001] The invention relates to a display panel manufacturing process, in particular to a metal mesh plate and an evaporation mask device with the metal mesh plate. Background technique [0002] OLED (Organic Light Emitting Display, organic light-emitting display device) has the characteristics of low self-luminous power consumption, fast response speed, high contrast, and wide viewing angle; Green) and B (blue) are vapor-deposited respectively, and a mask plate is required to shield the non-evaporation area during the vapor-deposition process. [0003] With the development of technology and the continuous improvement of product resolution, the requirements for the refinement of the metal mask are also increasing; before the metal mesh is welded to the frame, the metal mesh needs to be flattened by the stretching equipment, but in During the stretching process, wrinkles will appear on the surface of the metal stencil, which will lead to the deformation of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
12 Dec 2017
Publication
CN107460436A
IPC
C23C14/04; C23C14/24
CPC
C23C14/042; C23C14/24; H10K71/166
Inventors
张鹏