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Method for preparing detection substrate film by ion sputtering

An ion sputtering method and a technology for detecting substrates, which are applied in the field of particle film preparation, can solve problems such as inaccurate particle size of silver particle films and impure silver particles, and achieve the effect of improving the accuracy of detection results and enhancing the enhancement effect

Inactive Publication Date: 2019-11-26
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In view of the deficiencies in the prior art, the present invention provides a method for preparing a detection substrate film by ion sputtering, which solves the problems of impure silver particles and inaccurate particle size of the silver particle film in the detection substrate film

Method used

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  • Method for preparing detection substrate film by ion sputtering
  • Method for preparing detection substrate film by ion sputtering
  • Method for preparing detection substrate film by ion sputtering

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] 1) Pickling the surface of the detection substrate as a substrate;

[0047] 2) Carry out vacuum discharge detection and correction on the ion sputtering instrument, and the preset target silver particle film particle size is 20nm;

[0048] 3) At a constant current of 20mA, through the K550x ion sputtering instrument, using the ion sputtering method, using the silver target as the initial material, the silver particle film is evaporated on the substrate, and the initial evaporation time is used to control the evaporation time t 0 =10s, at this time, the smallest silver particles are formed on the silver target and adhere to the surface of the substrate.

[0049] 4) Using Shimadzu ultraviolet-visible-near-infrared absorption spectrometer (UV-1750) to measure silver particle film particles: peak position 437nm, peak intensity 72×10 -4 , The area density is 94 / μm, and the actual silver particle film particle size is 20nm;

[0050] 5) Determine that the actual silver partic...

Embodiment 2

[0052] 1) Pickling the surface of the detection substrate as a substrate;

[0053] 2) Carry out vacuum discharge detection and correction on the ion sputtering instrument, and the preset target silver particle film particle size is 21nm;

[0054] 3) At a constant current of 20mA, through the K550x ion sputtering instrument, using the ion sputtering method, using the silver target as the initial material, the silver particle film is evaporated on the substrate, and the initial evaporation time is used to control the evaporation time t 0 = 10s, at this time, the smallest silver particles are formed on the silver target and adhere to the surface of the substrate, and the silver particle film particles are measured by Shimadzu ultraviolet-visible-near-infrared absorption spectrometer (UV-1750): the peak position is 437nm, and the peak intensity is 72× 10 -4 , The area density is 94 / μm, and the actual silver particle film particle size is 20nm;

[0055] 4) determine that the act...

Embodiment 3

[0059] 1) Pickling the surface of the detection substrate as a substrate;

[0060] 2) Carry out vacuum discharge detection and correction on the ion sputtering instrument, and the preset target silver particle film particle size is 29nm;

[0061] 3) At a constant current of 20mA, through the K550x ion sputtering instrument, using the ion sputtering method, using the silver target as the initial material, the silver particle film is evaporated on the substrate, and the initial evaporation time is used to control the evaporation time t 0 =10s, adopt Shimadzu ultraviolet-visible-near-infrared absorption spectrometer (UV-1750) silver particle film particle to measure: peak position 437nm, peak intensity 72×10 -4 , The area density is 94 / μm, and the actual silver particle film particle size is 20nm;

[0062] 4) determine that the actual silver particle film particle size is smaller than the target silver particle film particle size, and perform the next step;

[0063] 5) Initial...

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Abstract

The invention provides a preparing method for a detected substrate film by using an ion sputtering method, and belongs to the technical field of granular film preparation. The preparing method includes the steps that (1) pickling is conducted on the surface of a detecting substrate, and the detecting substrate is used as a substrate sheet; (2) an ion sputtering apparatus is corrected, and the particle size of a target silver particle film is preset; (3) a silver target material is used as an initial material by using the ion sputtering method, the silver particle film is evaporated on the substrate lining bottom, the initial evaporation time is set, and the actual silver particle film particle size on the substrate is determined; (4) if the fact that the actual silver particle film particle size is smaller than the target silver particle film particle size is judged, the step (5) is performed, if not, the step (6) is performed; (5) the evaporation time is increased on the basis of theinitial evaporation time, the silver target material is evaporated again, the particle size of the actual silver particle film is measured, and the step (4) is repeated; and (6) whether the silver particle film is qualified or not is judged. By means of the ion sputtering method, the peak position of a silver particle is measured under different evaporation times according to the silver particle film, so that the precise particle size of the silver particle film is determined in order to improve the accuracy of detection of the detected substrate film.

Description

technical field [0001] The invention relates to the technical field of particle film preparation, in particular to a method for determining the particle size of a film when detecting a film coated on a substrate film by using an ion sputtering method. Background technique [0002] The particle size of metallic silver particles is less than 100nm, which has special physical and chemical properties, such as low electronic conversion performance, high catalytic performance, etc., and has important application prospects in the fields of antibacterial drugs, optical detection and catalysis, and has become more and more popular in various countries. research attention. For different silver particle sizes, the surface enhancement effect produced is also different. Due to the unique high surface energy properties of this kind of silver particles, it is widely used in the detection of trace substances in environmental pollutants. It can be used as a detection substrate film with a s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/18C23C14/46C23C14/32
Inventor 孔明光吴兵刘玲
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI